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- Exceptional Electro-Optic Performance: Extremely high electro-optic coefficients enabling high-speed modulation and tunable devices.
- High Dielectric Constant: Useful for applications in capacitors and tunable microwave devices.
- Wide Transparency Range: Optical transmission from near-UV (~400 nm) to mid-IR (~5.5 μm).
- Tunable Refractive Index: Ability to electrically modulate optical properties.
- Low Optical Absorption: High transmission and low loss across the IR and visible spectrum.
- Precise Composition Control: Customizable Nb/Ta ratios (x values) to tailor ferroelectric and optical properties.
- Good Chemical Stability: Suitable for long-term operation in standard laboratory environments.
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- High Nonlinear Optical Coefficient: ~15 times that of KDP crystals.
- Broad Transparency Range: 350 nm to 4500 nm.
- High Damage Threshold: >500 MW/cm² for nanosecond pulses.
- Excellent Electro-optic Properties: Suitable for Q-switching and Pockels cells.
- Large Angular Acceptance and Low Walk-off Angle: Easier beam alignment and higher conversion efficiency.
- Stable Physical and Chemical Properties: High mechanical strength and environmental stability.
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- High Structural Perfection: Ideal lattice matching for growing oxide thin films such as superconductors and ferroelectric films.
- Excellent Dielectric Properties: High dielectric constant makes it suitable for tunable capacitors and microwave applications.
- Low Optical Absorption: Transparent in the visible to near-infrared spectrum, useful for optoelectronic devices.
- High Mechanical and Chemical Stability: Ensures robustness in diverse environments.
- Ferroelectric and Quantum Paraelectric Behavior: Suitable for research in quantum phase transitions and low-temperature physics.
- Epitaxial Growth Substrate: Preferred for epitaxy of functional oxide materials such as high-temperature superconductors, ferroelectric, and multiferroic materials.
