Showing 217–228 of 653 results

  • FeGa Sputtering Targets 99.9%-99.9999% High Purity Ferrum Iron Gallium Alloy Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan Materials

    FeGa (Iron-Gallium) Sputtering Targets

    • High Magnetostriction: FeGa alloys exhibit superior magnetostrictive properties, providing enhanced performance in functional films.
    • Customizable Compositions: Available in various iron-gallium ratios to meet specific application requirements.
    • High Purity: Ensures consistent and reliable thin-film deposition with minimal contamination.
    • Excellent Magnetic Properties: Combines strength and magnetic responsiveness for advanced thin-film applications.
    • Durable and Stable: Provides robust and long-lasting performance in challenging environments.
  • FeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeHf (Iron Hafnium) Alloy Target

    • Magnetic Stability: FeHf alloys offer stable magnetic properties that make them suitable for use in a variety of magnetic devices, especially in high-temperature or harsh environments.
    • Oxidation Resistance: The addition of hafnium significantly improves the alloy’s resistance to oxidation, making FeHf thin films suitable for applications exposed to elevated temperatures and oxidative conditions.
    • High Strength: FeHf alloy thin films provide excellent mechanical strength, ensuring long-term durability and reliability in high-stress environments.
    • Thermal Stability: FeHf alloys maintain their structural integrity and performance even at high temperatures, making them ideal for applications in electronics, aerospace, and industrial settings.
    • Corrosion Resistance: The alloy’s resistance to corrosion allows it to perform well in harsh environments, protecting components from degradation due to moisture, chemicals, and other corrosive elements.
  • FeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeMn (Iron Manganese) Alloy Target

    • Magnetic Properties: FeMn alloys exhibit useful magnetic properties, including antiferromagnetism, which makes them suitable for use in a variety of magnetic devices, sensors, and memory technologies.
    • Corrosion Resistance: The alloy provides excellent resistance to corrosion, making it ideal for use in environments exposed to moisture, chemicals, and other corrosive agents.
    • Wear Resistance: FeMn alloy thin films enhance the wear resistance of components, making them more durable under mechanical stress and wear, especially in industrial and mechanical applications.
    • Customizable Composition: The ratio of iron to manganese can be adjusted to tailor the magnetic, mechanical, and corrosion-resistant properties of the thin films for specific applications.
    • High Strength: FeMn thin films exhibit high mechanical strength, making them ideal for applications where both durability and protection are required, especially in harsh environments.
  • FeMn Granules Evaporation Material 2N-6N High Purity Iron Manganese Pellets Particles for Coating High Pure 99%-99.9999% Customized - Tinsan Materials

    FeMn (Iron Manganese) Pellets Granules Evaporation Materials

    • Enhanced Strength: Increases the mechanical strength and wear resistance of the final product.
    • Improved Corrosion Resistance: Offers better resistance to oxidation and corrosion compared to pure iron.
    • Adjustable Composition: The ratio of iron to manganese can be tailored to meet specific performance requirements.
  • FeMnAICrTi Powder High Purity Iron Manganese Aluminum Chromium Titanium Nanopowder Nano Powder Nanoparticles Customized - Tinsan Materials

    FeMnAICrTi (Iron Manganese Aluminum Chromium Titanium) Powder

    • High Strength-to-Weight Ratio: Combines durability with lightweight characteristics.
    • Corrosion Resistance: Excellent performance in harsh environments.
    • Thermal Stability: Maintains properties at elevated temperatures.
    • Versatile Applications: Compatible with additive manufacturing, coatings, and traditional metallurgy.
    • Customizable Composition: Tailored to meet specific project requirements.
  • FeW Pellets Evaporation Materials 2N-5N High Purity Iron Tungsten Alloy Granules Particles for Coatings High Pure 99%-99.999% Customized - Tinsan Materials

    FeW (Iron Tungsten) Pellets Granules Evaporation Materials

    • High Hardness: Ensures excellent wear resistance for industrial applications.
    • Thermal Stability: Performs reliably under high-temperature environments.
    • Corrosion Resistance: Excellent chemical stability in harsh conditions.
    • Customizable Compositions: FeW ratios tailored to specific application requirements.
    • Versatile Particle Sizes: Available in nano to micrometer scales for diverse uses.
  • FTO Sputtering Targets 3N-6N High Purity Fluorine-doped Tin Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    FTO (Fluorine-doped Tin Oxide) Sputtering Targets

    • High Transparency: Excellent light transmission in the visible spectrum.
    • Superior Conductivity: Low sheet resistance for high-performance electrical applications.
    • Thermal Stability: Performs reliably under high temperatures.
    • Chemical Resistance: Highly resistant to environmental and chemical degradation.
    • Customizable Options: Adaptable to diverse deposition system requirements.
  • Gallium Pellets Evaporation Material 4N-7N High Purity Metal Ga Granules Particles for Coating High Pure 99.99%-99.99999% Customized - Tinsan Materials

    Ga Gallium Pellets Granules Evaporation Materials

    • High Purity: Available in 99.99% (4N) or higher purity levels to ensure contamination-free thin films, crucial for high-precision semiconductor and optoelectronic applications.
    • Low Melting Point: Gallium’s low melting point (29.76°C) allows for easy evaporation and controlled deposition processes.
    • Good Wetting Properties: Gallium forms uniform films with excellent adhesion to substrates, critical for consistent and reliable thin-film layers.
    • Optoelectronic Properties: Gallium’s ability to form gallium-based compounds, such as GaAs and GaN, makes it indispensable in high-performance optoelectronics.
    • Versatile Deposition: Suitable for use in thermal and electron beam evaporation systems for consistent and high-quality film growth.
    • Chemical Stability: Gallium is resistant to oxidation, ensuring stable and long-lasting films in various environments.
  • Ga2O3 Pellets Evaporation Material 4N-6N High Purity Gallium Oxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    Ga2O3 (Gallium Oxide) Pellets Granules Evaporation Materials

    • Wide Bandgap (4.8 eV): Ga₂O₃ is a wide-bandgap semiconductor, offering superior electrical performance in power electronics and UV detection.
    • High Optical Transparency: Ga₂O₃ is transparent in the UV-visible range, making it an ideal material for optical applications.
    • High Thermal and Chemical Stability: The material exhibits stability under extreme thermal conditions, enhancing its performance in harsh environments.
    • Excellent Thin Film Quality: Ga₂O₃ forms smooth, uniform thin films, ensuring high precision in electronic and optical devices.
    • Low Cost and Availability: Compared to other wide-bandgap semiconductors like SiC or GaN, Ga₂O₃ offers a cost-effective alternative for high-performance electronics.
  • Ga2O3 Powder 4N-6N High Purity Gallium Oxide Nanopowder Nano Powder Nanoparticles High Pure 99.99%-99.9999% Customized - Tinsan Materials

    Ga2O3 (Gallium Oxide) Powder

    • Wide Bandgap: Enables applications in high-power and high-frequency electronic devices.
    • High Purity: Ensures reliability and performance in critical applications.
    • Thermal Stability: Excellent performance in high-temperature environments.
    • UV Transparency: Outstanding optical properties for UV applications.
    • Customizable Particle Size: Tailored to meet specific application requirements.
  • GaN Sputtering Target 4N-5N High Purity Gallium Nitride Ceramic Sputtering Targets High Pure 99.99%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    GaN (Gallium Nitride) Sputtering Targets

    • Chemical Formula: GaN
    • Molecular Weight: 83.73 g/mol
    • Density: 6.15 g/cm³
    • Bandgap: ~3.4 eV
    • Melting Point: ~2500°C (decomposes)
    • Purity Levels: 99.99% (4N), 99.999% (5N)
    • Electrical Conductivity: High electron mobility and breakdown voltage
    • Thermal Conductivity: Excellent heat dissipation for high-power applications
  • GaS Sputtering Target 3N-6N High Purity Gallium Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GaS (Gallium Sulfide) Sputtering Target

    • Wide Bandgap: GaS possesses a wide bandgap of about 2.5 eV, making it suitable for UV and visible light applications.
    • High Purity: GaS targets are available in high-purity forms to ensure the quality and performance of the deposited films.
    • Layered Structure: The layered nature of GaS allows for easy mechanical exfoliation, enabling the production of high-quality monolayers and thin films.
    • Thermal Stability: GaS exhibits good thermal stability, maintaining its properties during high-temperature processing.
    • Good Electrical Conductivity: GaS is a good electrical conductor, making it valuable in electronic applications.