Showing 289–300 of 674 results
-
- Antiferromagnetic Properties: IrMn alloy thin films exhibit strong antiferromagnetic behavior, which is essential for magnetic pinning in spintronic devices and memory storage.
- High Corrosion Resistance: Iridium provides excellent corrosion resistance, ensuring the durability and longevity of the deposited thin films, even in harsh environments.
- Thermal Stability: IrMn alloy films are thermally stable, making them ideal for high-temperature applications in electronic and magnetic devices.
- Customizable Size and Shape: IrMn sputtering targets are available in various sizes and shapes, including discs, plates, and custom geometries, to suit a wide range of deposition systems.
-
$100.00 – $780.00
- High Electrical Conductivity: ITO films exhibit excellent electrical conductivity, allowing for efficient electron transport in devices like displays, sensors, and solar cells.
- Optical Transparency: ITO combines electrical conductivity with high transparency in the visible spectrum, making it essential for devices that require a clear view, such as displays and touchscreens.
- Wide Bandgap (3.5-4.3 eV): The wide bandgap of ITO makes it suitable for transparent conducting electrodes, ensuring minimal interference with visible light.
- Durability: ITO coatings are robust and can withstand environmental stress, including UV exposure and high temperatures, ensuring long-lasting performance.
- Customizable Conductivity and Transparency: The ratio of indium to tin can be adjusted to optimize the balance between conductivity and transparency based on the specific application needs.
-
- High Transparency and Conductivity: ITO offers a balance of excellent transparency in the visible spectrum and good electrical conductivity, making it a perfect material for applications requiring both.
- Adjustable Stoichiometry: The ratio of In2O3 to SnO2 in ITO can be adjusted to optimize its electrical and optical properties for specific applications.
- Thin-film Uniformity: ITO films are known for their uniform thickness and quality, essential for ensuring consistent performance across large-area coatings like touchscreens and solar panels.
- Durability: ITO films are chemically stable and durable, providing long-term performance in various environmental conditions.
- Custom Purity Levels: ITO sputtering targets are available in a variety of purities (up to 99.999%) to meet the stringent requirements of high-performance electronic and optical devices.
-
- High Optical Transparency: Enables the creation of efficient transparent films.
- Superior Conductivity: Provides excellent electrical performance for electronic applications.
- Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
- Customizable Material Composition: Optimized for specific TCO requirements.
- Compatibility: Suitable for RF and DC sputtering systems.
-
- Exceptional Electro-Optic Performance: Extremely high electro-optic coefficients enabling high-speed modulation and tunable devices.
- High Dielectric Constant: Useful for applications in capacitors and tunable microwave devices.
- Wide Transparency Range: Optical transmission from near-UV (~400 nm) to mid-IR (~5.5 μm).
- Tunable Refractive Index: Ability to electrically modulate optical properties.
- Low Optical Absorption: High transmission and low loss across the IR and visible spectrum.
- Precise Composition Control: Customizable Nb/Ta ratios (x values) to tailor ferroelectric and optical properties.
- Good Chemical Stability: Suitable for long-term operation in standard laboratory environments.
-
- High Nonlinear Optical Coefficient: ~15 times that of KDP crystals.
- Broad Transparency Range: 350 nm to 4500 nm.
- High Damage Threshold: >500 MW/cm² for nanosecond pulses.
- Excellent Electro-optic Properties: Suitable for Q-switching and Pockels cells.
- Large Angular Acceptance and Low Walk-off Angle: Easier beam alignment and higher conversion efficiency.
- Stable Physical and Chemical Properties: High mechanical strength and environmental stability.
-
Lanthanum sputtering targets are crucial for creating thin films with specific electronic, optical, and catalytic properties, making them valuable in advanced technologies such as semiconductors, optics, superconductors, and energy storage systems. Despite its reactivity, lanthanum’s unique characteristics provide significant advantages in various high-tech industrial and scientific applications.
-
- High Refractive Index: La₂O₃ has one of the highest refractive indices among the oxides, making it highly suitable for optical applications where precise light manipulation is required.
- Excellent Dielectric Properties: It has a high dielectric constant, which is beneficial for use in electronic devices and capacitors.
- Infrared Transparency: La₂O₃ is transparent in the infrared spectrum, which makes it an ideal material for infrared optics and laser applications.
- High Purity: The high purity of La₂O₃ pellets ensures the production of high-quality thin films with minimal contamination.
-
- High Purity: ≥99.9% purity, ensuring superior performance in critical applications.
- Optical Properties: Excellent refractive index and high transparency in the infrared spectrum, ideal for optical applications.
- Catalytic Properties: Highly effective as a catalyst in industrial processes such as petroleum refining and environmental protection.
- Chemical Stability: Chemically stable and resistant to high temperatures and oxidation, making it durable for high-performance applications.
- Versatile Applications: Suitable for use in a wide range of industries, from electronics and ceramics to environmental technologies.
-
- High Dielectric Constant: La₂O₃ exhibits a high dielectric constant, making it an excellent material for advanced electronic components, such as gate dielectrics in MOSFETs.
- High Refractive Index: Its high refractive index makes it ideal for enhancing optical properties in coatings for lenses, filters, and other precision optical devices.
- Thermal and Chemical Stability: La₂O₃ is highly stable under extreme temperatures and chemically resistant, making it suitable for high-performance applications.
- Catalytic Efficiency: Lanthanum oxide’s catalytic properties are leveraged in thin films used for environmental and energy applications.
-
- High Dielectric Constant: LaAlO₃ has a high dielectric constant (k-value), which enhances its performance in capacitors and other high-k dielectric applications.
- Thermal Stability: LaAlO₃ exhibits excellent thermal stability, making it ideal for high-temperature processing and devices that operate in extreme environments.
- Structural Integrity: The perovskite structure of LaAlO₃ contributes to its high mechanical strength and chemical stability, ensuring long-lasting performance in demanding applications.
- Oxide Electronics: LaAlO₃ is widely used in complex oxide electronics due to its ability to form high-quality interfaces with other materials like SrTiO₃ and LaNiO₃.
-
- Excellent Crystal Quality: Low dislocation density, high structural perfection.
- Ideal Lattice Match: Close lattice parameters with materials like YBCO, LSMO, PZT, and other perovskite oxides.
- High Thermal Stability: Suitable for high-temperature thin film deposition processes.
- High Dielectric Constant: Beneficial for microwave devices and tunable capacitors.
- Low Dielectric Loss: Ensures superior performance at high frequencies.
- Chemical Stability: Strong resistance to acids and bases.
- Atomically Smooth Surface: Achieved through advanced polishing and chemical etching processes.
