Showing 169–180 of 251 results

  • Sb2Se3 Sputtering Target 3N-6N High Purity Antimony Selenide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSb2Se3 Sputtering Target 3N-6N High Purity Antimony Selenide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2Se3 (Antimony Selenide) Sputtering Target

    • High Absorption Coefficient: Sb₂Se₃ has a high absorption coefficient, which makes it effective for thin-film solar cells and light-harvesting applications.
    • Bandgap: The material has a bandgap around 1.1 to 1.3 eV, ideal for photovoltaic devices aimed at capturing sunlight efficiently.
    • Non-Toxic and Earth-Abundant: Sb₂Se₃ offers an environmentally friendlier and more sustainable alternative to other thin-film materials like cadmium-based compounds.
    • Stable Crystal Structure: Sb₂Se₃ thin films exhibit a stable orthorhombic crystal structure, which contributes to their robustness in various electronic and energy-related applications.
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  • Sb2Te3 Sputtering Target 3N-6N High Purity Antimony Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSb2Te3 Sputtering Target 3N-6N High Purity Antimony Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sb2Te3 (Antimony Telluride) Sputtering Target

    • High Thermoelectric Efficiency: Sb₂Te₃ exhibits excellent thermoelectric performance with a high figure of merit (ZT) near room temperature, making it one of the most effective materials for energy conversion and cooling applications.
    • Phase-Change Properties: Its ability to rapidly switch between different phases with thermal cycling makes Sb₂Te₃ ideal for memory devices such as phase-change random-access memory (PCRAM).
    • Topological Insulator Properties: Sb₂Te₃ is used in cutting-edge research into topological insulators, with potential applications in quantum computing and advanced electronics.
    • Customizable Thin Films: Sputtering targets allow for controlled deposition of Sb₂Te₃ films with tailored thickness, composition, and properties for specific device requirements.
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  • Scandium Sputtering Target 99.99%-99.9999% High Purity Sc Metal Sputtering Targets CustomizedScandium Sputtering Target 99.99%-99.9999% High Purity Sc Metal Sputtering Targets Customized

    Sc Scandium Sputtering Target

    Scandium sputtering targets are essential in applications that require lightweight, high-performance coatings, particularly in the semiconductor, aerospace, and advanced materials sectors. Despite its rarity, scandium’s unique properties make it a valuable material for cutting-edge technologies.

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  • Sc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sc2O3 (Scandium Oxide) Sputtering Target

    • High Dielectric Constant: Sc₂O₃ is known for its high dielectric constant, making it useful in capacitors and semiconductor devices.
    • Thermal Stability: Sc₂O₃ maintains its properties even at elevated temperatures, making it suitable for harsh environments.
    • Optical Transparency: Sc₂O₃ is transparent across a wide range of wavelengths, from UV to IR, which is beneficial in optical coatings and devices.
    • Corrosion Resistance: Sc₂O₃ thin films are highly resistant to chemical corrosion, enhancing the longevity of coated surfaces.
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  • Selenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsSelenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Se Selenium Sputtering Targets

    • Purity: High-purity selenium (typically 99.9% or higher) ensures the quality of the deposited films and consistent performance.
    • Photoconductivity: Selenium is highly photoconductive, making it ideal for optoelectronic and photovoltaic applications.
    • Customizable Size and Shape: Selenium sputtering targets are available in different forms, including discs, plates, and custom shapes, to fit a variety of PVD systems.
    • Thermal and Electrical Properties: Selenium films offer excellent thermal and electrical properties, crucial for semiconductor and photovoltaic devices.
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  • Silicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan MaterialsSilicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan Materials

    Si Silicon Sputtering Targets (Intrinsic/N-Type/P-Type)

    • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
    • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
    • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
    • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.
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  • Si2Te3 Sputtering Targets 2N5-6N High Purity Silicon Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Si2Te3 (Silicon Telluride) Sputtering Targets

    • High Purity: Ensures minimal contamination and consistent deposition performance.
    • Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
    • Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
    • Excellent Film Properties: Supports the production of uniform, high-quality thin films.
    • Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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  • SiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SiC (Silicon Carbide) Sputtering Targets

    • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
    • Chemical Resistance: Resilient to corrosive environments.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
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  • Silicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 50 50.8 60 76.2 100 101.6 mm Custom Sizes & Thickness Options - Tinsan MaterialsSilicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 50 50.8 60 76.2 80 100 101.6 mm Custom Sizes & Thickness Options - Tinsan Materials

    Silicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm | Custom Sizes & Thickness Options

    $46.00 – $200.00
    • Ultra-high purity 5N (99.999%) for superior thin-film quality and minimal contamination.
    • Stable electrical properties due to controlled N-type doping.
    • Excellent sputtering performance with uniform deposition and low particle generation.
    • Available in multiple diameters for different PVD systems.
    • Customizable in purity, doping type, diameter, thickness, and bonding options.
    Select optionsDone This product has multiple variants. The options may be chosen on the product page
  • Silicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 50 50.8 60 76.2 80 100 101.6 mm Custom Thickness & Size Options - Tinsan MaterialsSilicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 50.8 60 76.2 80 100 101.6 mm Custom Thickness & Size Options - Tinsan Materials

    Silicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm | Custom Thickness & Size Options

    $46.00 – $200.00
    • Ultra-high purity 5N Silicon ensures extremely low impurity levels and superior thin-film quality.
    • Stable p-type electrical conductivity ideal for semiconductor and solar applications.
    • Excellent sputtering uniformity with minimal particle generation.
    • Multiple standard diameters in stock for fast order fulfillment.
    • Fully customizable target dimensions, purity, and doping concentration.
    Select optionsDone This product has multiple variants. The options may be chosen on the product page
  • SiO Sputtering Targets 3N-6N High Purity Silicon Monoxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SiO (Silicon Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and consistent performance.
    • Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
    • Stable and Durable: High thermal and chemical stability for demanding processes.
    • Customizable Options: Available in various sizes, purities, and configurations.
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