Showing 241–252 of 255 results

  • Ytterbium Sputtering Target 99.9%-99.9999% High Purity Yb Metal Sputtering Targets 3N-6N CustomizedYtterbium Sputtering Target 99.9%-99.9999% High Purity Yb Metal Sputtering Targets 3N-6N Customized

    Yb Ytterbium Sputtering Target

    Ytterbium sputtering targets are crucial in applications that require unique electronic, optical, and magnetic properties, particularly in the fields of semiconductors, optoelectronics, and advanced materials. Despite its rarity, ytterbium’s distinctive characteristics make it a valuable material for cutting-edge technological innovations.

  • Yb2O3 Sputtering Target 3N-6N High Purity Ytterbium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Yb2O3 (Ytterbium Oxide) Sputtering Target

    • High Optical Transparency: Yb₂O₃ provides excellent transparency in the infrared region, making it ideal for IR optics and laser systems.
    • Thermal and Chemical Stability: Ytterbium Oxide is thermally and chemically stable, which ensures longevity and performance in high-temperature and chemically harsh environments.
    • High Purity and Low Defects: Yb₂O₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, critical for applications in optics and electronics.
    • Rare-Earth Material: As a rare-earth oxide, Yb₂O₃ possesses unique electronic properties, making it highly valuable for specific applications in advanced technology.
  • YF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsYF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    YF3 (Yttrium Trifluoride) Sputtering Targets

    • Low Refractive Index: YF₃ films offer a low refractive index, making them ideal for anti-reflective coatings and optical thin films.
    • High Purity: Available in ≥99.9% purity, ensuring clean deposition and minimal contamination in thin-film applications.
    • Chemical Resistance: Resistant to acid and alkali, making it suitable for harsh environments.
    • Optical Transparency: High optical transparency in the UV and visible spectra, enhancing the performance of optical coatings.
    • Durability: Offers excellent mechanical properties and resistance to environmental degradation, ensuring long-term stability.
  • Zinc Sulfide (ZnS) Sputtering Target 99.99% – Multiple Diameters With Copper Backing Plate & Magnetic Spacer OptionsZinc Sulfide (ZnS) Sputtering Target 99.99% – Multiple Diameters With Copper Backing Plate & Magnetic Spacer Options - Tinsan Materials

    Zinc Sulfide (ZnS) Sputtering Target 99.99% – Multiple Diameters | With Copper Backing Plate & Magnetic Spacer Options

    $255.00$565.00
    • High purity 99.99% ZnS for stable and reproducible thin film deposition
    • Excellent optical and infrared performance, suitable for IR coatings
    • Multiple standard diameters compatible with most magnetron sputtering systems
    • Copper backing plate options for improved thermal conductivity
    • Magnetic spacer options for enhanced compatibility with magnetron cathodes
    • Low impurity levels and high material density
    • Customizable specifications for R&D and production use
    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Zinc Sputtering Target, 99.99%-99.999% High Purity Zn Metal Sputtering Targets CustomizedZinc Sputtering Target, 99.99%-99.999% High Purity Zn Metal Sputtering Targets Customized

    Zn Zinc Sputtering Target

    Zinc (Zn) sputtering targets are essential for industries that require corrosion-resistant, conductive, and versatile coatings, making them indispensable in electronics, optics, protective coatings, and energy-related applications.

  • Zn3Sb2 Sputtering Targets 3N-6N High Purity Zinc Antimony Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsZn3Sb2 Sputtering Targets 3N-6N High Purity Zinc Antimony Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Zn3Sb2 (Zinc Antimony) Sputtering Targets

    • Thermoelectric Properties: Zn₃Sb₂ is known for its high thermoelectric efficiency, making it an excellent material for energy conversion applications.
    • High Purity: Available in various purity grades, ensuring the production of high-quality thin films.
    • Stable Deposition: Consistent film quality and performance, ideal for advanced manufacturing processes.
    • Durability: Offers excellent thermal stability, reducing the risk of material degradation during deposition and application.
    • Wide Application Range: Suitable for a variety of industries, including semiconductor, energy, and sensing technologies.
  • ZnO Sputtering Target 3N-6N High Purity Zinc Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZnO Sputtering Target 3N-6N High Purity Zinc Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZnO (Zinc Oxide) Sputtering Target

    • High Transparency: ZnO thin films offer excellent transparency in the visible light spectrum, making them ideal for applications requiring both optical clarity and electrical conductivity.
    • Good Conductivity: ZnO is a conductive oxide, providing good electrical performance in devices such as transparent electrodes and sensors.
    • Wide Bandgap: ZnO is a wide-bandgap semiconductor with a bandgap of around 3.37 eV, allowing for efficient performance in UV detection and emission applications.
    • Piezoelectric Properties: ZnO exhibits piezoelectric behavior, which is beneficial for applications in sensors, resonators, and energy-harvesting devices.
    • Environmental Stability: ZnO thin films are chemically stable and exhibit good resistance to environmental degradation, ensuring long-term durability in various applications.
  • ZnS Sputtering Target 3N-6N High Purity Zinc Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZnS Sputtering Target 3N-6N High Purity Zinc Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZnS (Zinc Sulfide) Sputtering Target

    • Broad Transmission Range: ZnS exhibits excellent transmission in the visible, near-infrared (NIR), and mid-infrared (MWIR) regions, making it suitable for a wide range of optical applications.
    • High Refractive Index: ZnS has a high refractive index, which is beneficial for designing optical coatings with precise reflection and transmission properties.
    • Chemical and Thermal Stability: ZnS thin films are chemically stable and exhibit good thermal resistance, making them suitable for use in high-temperature and chemically aggressive environments.
    • Infrared Transparency: ZnS is known for its excellent transparency in the infrared spectrum, especially in thermal imaging systems, laser optics, and other IR-related devices.
  • ZnSe Sputtering Target 3N-6N High Purity Zinc Selenium Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsZnSe Sputtering Target 3N-6N High Purity Zinc Selenium Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    ZnSe (Zinc Selenide) Sputtering Target

    • Broad Optical Transmission: ZnSe offers high transmission from the visible to the IR range (0.6 µm to 16 µm), making it ideal for infrared optics and laser systems.
    • High Laser Damage Threshold: ZnSe can withstand high-power laser radiation, making it a preferred material for CO₂ laser optics and other high-energy laser applications.
    • Chemical and Thermal Stability: ZnSe is chemically stable and has good thermal shock resistance, ensuring reliable performance in challenging environments, such as thermal imaging and industrial laser systems.
    • High Purity and Low Absorption: ZnSe sputtering targets are available in high purity (up to 99.999%), ensuring minimal absorption and optimal performance in optical coatings and laser optics.
  • ZnTe Sputtering Targets 3N-6N High Purity Zinc Telluride Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Films Deposition - Tinsan Materials

    ZnTe (Zinc Telluride) Sputtering Targets

    • Optoelectronic Properties: ZnTe is highly valued for its ability to efficiently emit light, making it a key material in optoelectronics and LEDs.
    • High Purity: Available in various purity levels (99.9%, 99.99%, and higher) to ensure high-quality thin films.
    • Thermal Stability: ZnTe maintains its properties under high-temperature conditions, making it suitable for high-performance applications.
    • Customizable Sizes: Available in different diameters and thicknesses for a wide range of sputtering systems.
    • Wide Application Range: Ideal for use in numerous industries, including renewable energy, communications, and infrared sensing.
  • Zirconium Sputtering Target, 99.9%-99.999% High Purity Zr Metal Sputtering Targets CustomizedZirconium Sputtering Target, 99.9%-99.999% High Purity Zr Metal Sputtering Targets Customized

    Zr Zirconium Sputtering Target

    Zirconium sputtering targets are critical for industries that require materials with exceptional corrosion resistance, high-temperature stability, and biocompatibility, making them indispensable in electronics, aerospace, nuclear, and medical applications.

  • ZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsZrB2 Sputtering Target 3N-6N High Purity Zirconium Diboride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    ZrB2 (Zirconium Diboride) Sputtering Target

    • High Hardness: ZrB₂ is an extremely hard material, making it ideal for wear-resistant and protective coatings.
    • Thermal Stability: ZrB₂ sputtering targets produce thin films that can withstand high temperatures, making them suitable for use in harsh environments.
    • High Thermal Conductivity: ZrB₂ has excellent thermal conductivity, which is advantageous for heat management in high-performance coatings.
    • Chemical Resistance: ZrB₂ thin films are resistant to chemical attack, especially in high-temperature, corrosive environments.