Showing 205–216 of 251 results

  • Ti2O3 Sputtering Targets 3N-6N High Purity Titanium(III) Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti2O3 (Titanium(III) Oxide) Sputtering Targets

    • High Purity: Ensures uniform film deposition with minimal contamination.
    • Excellent Optical Properties: Provides transparency and reflectivity for optical applications.
    • Electrical Conductivity: Suitable for applications requiring conductive thin films.
    • Durable and Stable: Resistant to chemical and thermal degradation, ensuring long-lasting performance.
    • Versatile Compatibility: Can be used with various sputtering systems and processes.
  • Ti3O5 Sputtering Targets 2N5-6N High Purity Titanium Oxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Ti3O5 (Titanium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film quality.
    • Stable Performance: Exceptional thermal and chemical stability for demanding applications.
    • Customizable Configurations: Available in various sizes and forms to suit diverse deposition systems.
    • Optical Clarity: Produces transparent coatings with excellent optical properties.
    • Durability: High resistance to mechanical stress and environmental degradation.
  • TiAl Alloy Target 99.9%-99.9999% High Purity Titanium Aluminium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsTiAl Alloy Target 99.9%-99.9999% High Purity Titanium Aluminium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    TiAl (Titanium Aluminium) Alloy Target

    • High Strength-to-Weight Ratio: TiAl alloys combine the lightweight nature of aluminum with the strength of titanium, making them ideal for thin films in high-performance applications.
    • Corrosion and Oxidation Resistance: TiAl films provide excellent resistance to corrosion and oxidation, ensuring durability and longevity in harsh environments.
    • Thermal Stability: TiAl alloys can withstand high temperatures without losing mechanical properties, making them suitable for applications in high-temperature environments.
    • Good Adhesion: TiAl thin films exhibit excellent adhesion to substrates, which is crucial for semiconductor and coating applications where film integrity is vital.
    • Wear Resistance: The addition of titanium improves the hardness and wear resistance of TiAl coatings, contributing to extended tool life and enhanced component durability.
  • TiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan MaterialsTiB2 Sputtering Targets 2N5-5N High Purity Titanium Diboride Ceramic Sputtering Targets High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    TiB2 (Titanium Diboride) Sputtering Targets

    • Exceptional Hardness: Provides superior durability and wear resistance.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Electrical Conductivity: Suitable for electronic applications requiring conductive layers.
    • Corrosion Resistance: Withstands harsh chemical environments.
    • High Purity: Ensures consistent thin-film quality and reliable performance.
  • TiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiC Sputtering Target 3N-6N High Purity Titanium Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiC (Titanium Carbide) Sputtering Target

    • High Hardness: TiC coatings provide excellent hardness, making them suitable for wear-resistant applications like cutting tools and dies.
    • Corrosion Resistance: TiC films resist oxidation and corrosion, providing a protective barrier in harsh environments, including high-temperature applications.
    • Thermal Stability: TiC has high thermal stability, making it ideal for coatings in high-temperature operations such as aerospace and automotive components.
    • Electrical Conductivity: TiC exhibits good electrical conductivity, making it suitable for certain electronic and semiconductor applications where conductivity is critical.
    • Chemical Resistance: TiC coatings offer chemical resistance, providing protective layers against corrosive agents and harsh chemicals.
  • TiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiN Sputtering Target 3N-6N High Purity Titanium Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiN (Titanium Nitride) Sputtering Target

    • High Hardness: TiN coatings are known for their exceptional hardness, making them ideal for cutting tools and components subject to high friction and stress.
    • Corrosion Resistance: TiN provides excellent protection against corrosion and oxidation, extending the lifespan of coated parts and tools.
    • High Temperature Stability: TiN remains stable at high temperatures, making it suitable for applications in high-temperature environments such as aerospace or industrial machinery.
    • Good Electrical Conductivity: TiN is conductive and is often used in microelectronics as a barrier or adhesion layer in integrated circuits.
    • Gold-Like Appearance: TiN has a bright gold color, making it popular for decorative applications and coatings in architectural elements and consumer products.
  • SnS Sputtering Targets 3N-6N High Purity Tin Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Tin Sulfide (SnS) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures consistent and high-quality film deposition.
    • Optoelectronic Properties: Exhibits excellent absorption coefficients and semiconducting behavior.
    • Environmentally Friendly: Non-toxic and abundant material for sustainable applications.
    • Customizable Formulations: Tailored compositions to meet specific research and industrial needs.
    • Versatile Deposition: Compatible with RF and DC magnetron sputtering systems.
  • TiO Sputtering Targets 2N5-6N High Purity Titanium Monoxide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    TiO (Titanium Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and minimal contamination.
    • Stable Properties: Excellent thermal and chemical stability under deposition conditions.
    • Customizable Forms: Available in various sizes and shapes to suit specific system requirements.
    • Versatile Performance: Suitable for a wide range of thin-film applications.
    • Durability: High mechanical strength for extended usability.
  • TiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsTiO2 Sputtering Target 3N-6N High Purity Titanium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan Materials

    TiO2 (Titanium Dioxide) Sputtering Target

    • High Refractive Index: TiO₂ has one of the highest refractive indices among dielectric materials, making it ideal for optical coatings that require light management.
    • Photocatalytic Activity: TiO₂ is highly effective as a photocatalyst, breaking down organic compounds and providing self-cleaning or environmental purification functions.
    • High Dielectric Constant: TiO₂’s excellent dielectric properties make it useful in capacitors and other semiconductor applications requiring stable, insulating layers.
    • Thermal and Chemical Stability: TiO₂ films are stable under high temperatures and resistant to chemical attack, which is important for robust and long-lasting coatings.
    • UV Absorption: TiO₂ effectively absorbs UV light, making it suitable for applications in UV-blocking coatings or as a protective layer in various devices.
  • TiSb Sputtering Targets 99.5%-99.9999% High Purity Titanium Antimony Alloy Sputtering Target 2N5-6N Customized - Tinsan Materials

    TiSb (Titanium Antimony) Sputtering Targets

    • High Purity: Ensures consistent film quality and reduces defects in deposited layers.
    • Stable Composition: Titanium and antimony alloying for enhanced mechanical and chemical properties.
    • Versatile Applications: Compatible with a wide range of deposition techniques, including PVD and sputtering.
    • Customizable Options: Available in various compositions and dimensions to meet specific requirements.
    • Durability: Resistant to oxidation and corrosion, ensuring longevity during sputtering processes.
  • TiSi2 Sputtering Targets 3N-6N High Purity Titanium Silicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    TiSi2 (Titanium Silicide) Sputtering Targets

    • High Electrical Conductivity: Enables efficient current flow in thin films.
    • Thermal Stability: Performs well under high-temperature conditions.
    • High Purity: Ensures minimal impurities for precise and reliable deposition.
    • Versatility: Suitable for a wide range of deposition techniques, including magnetron sputtering.
    • Customizable Specifications: Tailored to meet the demands of diverse applications.
  • TiTe2 Sputtering Targets 3N-6N High Purity Titanium Ditelluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    TiTe2 (Titanium Ditelluride) Sputtering Targets

    • High Purity: Ensures optimal film quality and performance.
    • Excellent Electrical Conductivity: Suitable for advanced electronic applications.
    • Thermal Stability: Resilient under high-temperature deposition processes.
    • Layered Structure: Ideal for 2D material synthesis and related technologies.
    • Customizable Specifications: Available in tailored sizes, shapes, and configurations.