Showing 217–228 of 251 results

  • TiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsTiZrHfNb Alloy Target 99.9%-99.9999% High Purity Titanium Zirconium Hafnium Niobium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    TiZrHfNb (Titanium Zirconium Hafnium Niobium) Alloy Target

    • Superior Mechanical Strength: The combination of titanium, zirconium, hafnium, and niobium results in exceptional mechanical strength, making TiZrHfNb thin films suitable for applications exposed to extreme stress and high temperatures.
    • High Corrosion Resistance: This alloy’s ability to resist oxidation and corrosion, particularly in harsh and high-temperature environments, makes it ideal for aerospace, energy, and medical applications.
    • Thermal Stability: TiZrHfNb alloy thin films retain their structural integrity at elevated temperatures, making them suitable for use in high-heat applications, such as power generation systems and aerospace components.
    • Wear Resistance: The combination of hafnium and niobium in the alloy enhances wear resistance, making it perfect for applications requiring durable coatings, such as industrial tools and mechanical parts.
    • Biocompatibility: TiZrHfNb alloy is biocompatible, making it ideal for medical devices and implants where long-term stability and resistance to body fluids are required.
  • Tm2O3 Sputtering Targets 3N-6N High Purity Thulium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    Tm2O3 (Thulium Oxide) Sputtering Targets

    • High Purity: Ensures optimal performance and low impurity levels in thin films.
    • Exceptional Optical Properties: Ideal for laser and photonic applications.
    • Thermal Stability: Suitable for high-temperature processes.
    • Customizable Specifications: Adaptable to diverse application needs.
    • Compatibility: Works with various sputtering systems, including RF and DC.
  • Tm3Fe5O12 Sputtering Targets 2N5-6N High Purity Thulium Iron Garnet Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Tm3Fe5O12 (Thulium Iron Garnet) Sputtering Targets

    • High Purity: Ensures minimal contamination for superior thin-film properties.
    • Precise Stoichiometry: Optimized Tm₃Fe₅O₁₂ composition for consistent results.
    • Magnetic and Optical Excellence: Delivers high-performance film characteristics.
    • Robust Performance: Supports a wide range of deposition techniques.
    • Customizable Options: Tailored specifications for diverse deposition systems.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Tungsten Trioxide (WO3) Sputtering Targets

    • High Purity: Ensures consistent film quality and performance.
    • Customizable Dimensions: Available in a variety of sizes and shapes to meet specific requirements.
    • Excellent Durability: Suitable for high-temperature and high-power sputtering processes.
    • Uniformity: Enables consistent thin-film deposition for advanced technologies.
    • Eco-Friendly Applications: Ideal for energy-efficient devices like smart windows.
  • Vanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets CustomizedVanadium Sputtering Target 99.9%-99.9999% High Purity V Metal Sputtering Targets Customized

    V Vanadium Sputtering Target

    Vanadium sputtering targets are essential in industries that require strong, corrosion-resistant, and stable thin films. Their use in semiconductors, aerospace, superconducting materials, and energy storage highlights the versatility and importance of vanadium in advanced technology applications.

  • V2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsV2O5 Sputtering Target 3N-6N High Purity Vanadium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    V2O5 (Vanadium Pentoxide) Sputtering Target

    • Electrochromic Properties: V₂O₅ is a well-known electrochromic material, enabling the dynamic control of optical properties in thin films.
    • High Oxidation State: Vanadium pentoxide has a high oxidation state, which enhances its catalytic and electrochemical performance in various applications.
    • Thermal Stability: V₂O₅ is stable at high temperatures, making it suitable for thin-film applications that require resistance to heat.
    • Multifunctional: V₂O₅ is versatile and can be used in applications ranging from energy storage to optical and gas-sensing devices.
  • VC Sputtering Targets 2N5-6N High Purity Vanadium Carbide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Carbide (VC) Sputtering Targets

    • Exceptional Hardness: Provides outstanding resistance to abrasion and wear.
    • Chemical Stability: Maintains performance in harsh and reactive environments.
    • High Thermal Conductivity: Efficiently dissipates heat in critical applications.
    • Uniform Deposition: Ensures consistent film quality with minimal defects.
    • Customizable Options: Available in various sizes and purities for specialized applications.
  • VN Sputtering Targets 3N-6N High Purity Vanadium Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Vanadium Nitride (VN) Sputtering Targets

    • High hardness and wear resistance, ideal for demanding environments
    • Excellent corrosion resistance, prolonging the life of components
    • Stable and consistent film quality for precise deposition
    • Suitable for high-temperature and high-performance applications
    • Enhanced durability in harsh operational conditions
    • Compatible with various sputtering systems and deposition techniques
  • VB2 Sputtering Targets 2N5-6N High Purity Vanadium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VB2 (Vanadium Diboride) Sputtering Targets

    • Exceptional Hardness: VB₂ coatings provide unmatched surface durability and wear resistance.
    • High Electrical Conductivity: Ensures efficient conductivity for electronic applications.
    • Thermal Stability: Retains structural integrity under high-temperature conditions, making it suitable for extreme environments.
    • Chemical Stability: Resists corrosion in aggressive chemical and environmental conditions.
    • Customizable Dimensions: Tailored to specific application needs with a range of sizes and shapes available.
  • VO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsVO2 Sputtering Target 3N-6N High Purity Vanadium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    VO2 (Vanadium Dioxide) Sputtering Target

    • Phase Transition: One of the most distinctive features of VO₂ is its reversible phase transition from an insulator to a metal at around 68°C. This enables tunable electrical and optical properties, making it a versatile material in smart applications.
    • Thermochromic Behavior: VO₂’s thermochromic properties are used in energy-efficient coatings that automatically adjust their transparency and reflectivity based on temperature.
    • Optical Properties: VO₂ exhibits unique optical behavior, including changes in reflectivity and transmission with temperature, making it suitable for use in smart windows and optical devices.
    • Electrical Properties: VO₂ switches between insulating and metallic phases, making it useful for electronic switching applications, such as transistors and memory devices.
  • VSi2 Sputtering Targets 3N-6N High Purity Vanadium Disilicide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    VSi2 (Vanadium Disilicide) Sputtering Targets

    • Superior Electrical Conductivity: VSi₂ is an excellent conductor of electricity, making it ideal for applications where conductive coatings are required.
    • High Thermal Stability: The material maintains its integrity under high temperatures, making it suitable for high-temperature applications.
    • Hardness and Durability: Known for its wear resistance, VSi₂ is used in applications that demand exceptional durability and surface hardness.
    • Corrosion Resistance: Offers good resistance to corrosion, particularly in aggressive environments.
    • Customizable Sizes: Available in various sizes and thicknesses to meet specific application requirements.
  • Tungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets CustomizedTungsten Sputtering Target, 99.9%-99.9999% High Purity W Metal Sputtering Targets Customized

    W Tungsten Sputtering Target

    Tungsten sputtering targets are indispensable in industries that demand materials with high thermal and electrical conductivity, exceptional strength, and stability at extreme temperatures. These properties make tungsten a critical material in electronics, aerospace, energy, and medical applications.