Showing 229–240 of 251 results

  • WC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWC Sputtering Target 3N-6N High Purity Tungsten Carbide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WC (Tungsten Carbide) Sputtering Target

    • Exceptional Hardness: WC films offer high hardness, contributing to their use in tools and wear-resistant coatings.
    • Thermal Stability: Tungsten Carbide thin films can withstand high temperatures without degrading, making them suitable for high-temperature environments.
    • High Melting Point: WC has a melting point above 2,870°C, ensuring it retains its structural integrity in extreme conditions.
    • Corrosion Resistance: WC coatings provide strong resistance against corrosion, enhancing the longevity of components used in harsh environments.
    • Excellent Adhesion: WC sputtered films adhere well to various substrates, including metals and ceramics, ensuring durability and longevity of the coatings.
  • WO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsWO3 Sputtering Targets 3N-6N High Purity Tungsten Trioxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    WO3 (Tungsten Trioxide) Sputtering Targets

    • High Melting Point: WO₃ has a high melting point (~1473°C), making it suitable for high-temperature applications.
    • Chemical Stability: WO₃ is chemically stable and resistant to oxidation, ensuring long-term reliability in harsh environments.
    • Transparency Control: WO₃ films can be engineered for transparency modulation, useful in smart glass and energy-efficient windows.
    • High Conductivity: When doped or treated, WO₃ can exhibit increased electrical conductivity for various electronic applications.
  • WS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsWS2 Sputtering Target 3N-6N High Purity Tungsten Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    WS2 (Tungsten Disulfide) Sputtering Target

    • Low Friction Coefficient: WS2 thin films exhibit an extremely low coefficient of friction, which is beneficial for improving the performance of mechanical systems in high-friction environments.
    • Thermal Stability: WS2 coatings maintain their properties at elevated temperatures, making them suitable for high-temperature applications.
    • High Wear Resistance: WS2 offers exceptional wear resistance, extending the operational life of coated components subjected to abrasive conditions.
    • Chemical Inertness: WS2 is resistant to corrosion and oxidation, making it durable in harsh chemical environments.
    • Layered Structure: The unique layered structure of WS2 provides excellent lubricating properties due to the easy shearing between layers.
  • WSi2 Sputtering Targets 2N5-6N High Purity Tungsten Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    WSi2 (Tungsten Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Withstands high-temperature operations.
    • High Electrical Conductivity: Ideal for conductive and resistive layers.
    • Oxidation Resistance: Reliable performance in harsh environments.
    • High Purity: Ensures uniform deposition and minimal contamination.
    • Customizability: Available in various dimensions and purities to suit specific needs.
  • WTe2 Sputtering Targets 2N5-6N High Purity Tungsten Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    WTe2 (Tungsten Telluride) Sputtering Targets

    • High Purity: Ensures superior thin-film quality with minimal impurities.
    • Layered Structure: Supports the formation of ultra-thin films with excellent properties.
    • Stable Composition: Reliable and consistent deposition outcomes.
    • Versatile Application: Compatible with various sputtering systems and techniques.
    • Customizable Options: Tailored targets for specific research and industrial requirements.
  • WTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan MaterialsWTi Alloy Target 99.95%-99.9999% High Purity Tungsten Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    WTi (Tungsten Titanium) Alloy Target

    • High Melting Point: The combination of tungsten and titanium gives the alloy a high melting point, making WTi thin films highly durable and able to withstand extreme temperatures.
    • Oxidation and Corrosion Resistance: WTi thin films resist oxidation and corrosion, making them ideal for environments where materials are exposed to harsh conditions.
    • Excellent Adhesion: WTi thin films exhibit excellent adhesion to various substrates, which is crucial for thin-film performance in semiconductor and microelectronic applications.
    • Good Electrical Conductivity: Tungsten’s inherent conductivity is complemented by titanium, making the alloy an ideal choice for electrical applications, such as in semiconductors and thin-film resistors.
    • Mechanical Strength: The alloy’s mechanical strength ensures that WTi thin films are resistant to wear, making them suitable for use in hard coatings and other demanding applications.
  • Yttrium Sputtering Target 99.9%-99.9999% High Purity Yttrium Y Metal Sputtering Targets CustomizedYttrium Sputtering Target 99.9%-99.9999% High Purity Yttrium Y Metal Sputtering Targets Customized

    Y Yttrium Sputtering Target

    Yttrium sputtering targets are essential for producing thin films with high thermal stability, excellent corrosion resistance, and unique electronic or optical properties. Their applications in semiconductors, superconductors, optoelectronics, and advanced materials highlight yttrium’s importance in cutting-edge technology.

  • Y2O3 Sputtering Target 3N-6N High Purity Yttrium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsY2O3 Sputtering Target 3N-6N High Purity Yttrium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Y2O3 (Yttrium Oxide) Sputtering Target

    • High Thermal Stability: Y₂O₃ maintains stability even at high temperatures, making it suitable for applications that require heat resistance.
    • Wide Bandgap: Its wide bandgap allows Y₂O₃ to function effectively as an insulator and dielectric in electronic devices.
    • Excellent Optical Properties: Y₂O₃ exhibits high transmittance in the visible and infrared ranges, making it ideal for optical coatings and laser technologies.
    • Corrosion Resistance: Y₂O₃ offers excellent resistance to chemical corrosion, making it valuable in environments where exposure to aggressive chemicals is common.
  • Y3Fe5O12 Yttrium Iron Garnet Sputtering Targets 3N-6N High Purity YIG Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsY3Fe5O12 Yttrium Iron Garnet Sputtering Targets 3N-6N High Purity YIG Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Y3Fe5O12 (Yttrium Iron Garnet / YIG) Sputtering Targets

    • Excellent Magnetic Properties: High-quality films with strong magneto-optic effects.
    • Dielectric Stability: Low-loss properties for microwave and optical applications.
    • Thermal Resistance: Operates reliably under high temperatures.
    • High Purity: Ensures consistent film quality and performance.
    • Customizable: Tailored compositions and dimensions to meet specific requirements.
  • Ytterbium Sputtering Target 99.9%-99.9999% High Purity Yb Metal Sputtering Targets 3N-6N CustomizedYtterbium Sputtering Target 99.9%-99.9999% High Purity Yb Metal Sputtering Targets 3N-6N Customized

    Yb Ytterbium Sputtering Target

    Ytterbium sputtering targets are crucial in applications that require unique electronic, optical, and magnetic properties, particularly in the fields of semiconductors, optoelectronics, and advanced materials. Despite its rarity, ytterbium’s distinctive characteristics make it a valuable material for cutting-edge technological innovations.

  • Yb2O3 Sputtering Target 3N-6N High Purity Ytterbium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Yb2O3 (Ytterbium Oxide) Sputtering Target

    • High Optical Transparency: Yb₂O₃ provides excellent transparency in the infrared region, making it ideal for IR optics and laser systems.
    • Thermal and Chemical Stability: Ytterbium Oxide is thermally and chemically stable, which ensures longevity and performance in high-temperature and chemically harsh environments.
    • High Purity and Low Defects: Yb₂O₃ sputtering targets are available in high-purity grades (up to 99.999%), ensuring low defect densities in the deposited thin films, critical for applications in optics and electronics.
    • Rare-Earth Material: As a rare-earth oxide, Yb₂O₃ possesses unique electronic properties, making it highly valuable for specific applications in advanced technology.
  • YF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsYF3 Sputtering Targets 3N-6N High Purity Yttrium Trifluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    YF3 (Yttrium Trifluoride) Sputtering Targets

    • Low Refractive Index: YF₃ films offer a low refractive index, making them ideal for anti-reflective coatings and optical thin films.
    • High Purity: Available in ≥99.9% purity, ensuring clean deposition and minimal contamination in thin-film applications.
    • Chemical Resistance: Resistant to acid and alkali, making it suitable for harsh environments.
    • Optical Transparency: High optical transparency in the UV and visible spectra, enhancing the performance of optical coatings.
    • Durability: Offers excellent mechanical properties and resistance to environmental degradation, ensuring long-term stability.