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- High Reactivity: Calcium easily reacts with oxygen and nitrogen, making it ideal for certain oxidation-controlled processes.
- High Purity: Available in high-purity forms (≥ 99.9%), ensuring minimal impurities in thin film coatings.
- Good Evaporation Characteristics: Calcium has a relatively low evaporation temperature (842°C), allowing efficient deposition in vacuum environments.
- Versatile Applications: Calcium can be used for coatings that require lightweight, high-performance films in various high-tech applications.
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Calcium (Ca) sputtering targets are high-purity materials used in physical vapor deposition (PVD) processes, specifically sputtering, to create thin films of calcium on various substrates. These targets are essential in various advanced technologies, including electronics, optics, and materials science, due to calcium’s unique properties.
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- Broad Transparency Range: CaF₂ has excellent transmission from the UV (below 200 nm) to the IR (~10 µm) range, which makes it ideal for a wide variety of optical applications.
- Low Refractive Index: The material has a relatively low refractive index (~1.43), which minimizes Fresnel reflection losses and is useful in anti-reflective coatings.
- High Thermal Stability: CaF₂ can withstand high temperatures during evaporation, ensuring the stability of the material during thin-film deposition processes.
- Chemical Resistance: Calcium fluoride is chemically inert, offering durability and resistance to environmental degradation.
- Low Absorption: Its low absorption makes it suitable for high-power laser applications, especially in the UV region.
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- High Optical Transparency: Transparent in the UV to IR spectrum, ideal for optical applications.
- Low Absorption: Minimal light absorption, ensuring high-quality performance in various optical devices.
- Durability: Resistant to chemical attack and radiation, making it suitable for harsh environments.
- High Purity: ≥99.9% purity for consistent performance in high-precision applications.
- Excellent Thermal Stability: Retains properties even under high temperatures.
- Customizable Particle Size: Available in various particle sizes to meet the specific needs of customers.
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- Wide Optical Transparency: Effective from UV to IR spectra (0.13–11 μm).
- High Chemical Stability: Resistant to moisture and chemical degradation.
- Low Refractive Index: Reduces the need for complex multilayer coatings.
- Thermal Stability: Suitable for high-temperature thin-film deposition.
- High Purity: Ensures uniform film quality and minimizes defects.
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- Wide Transmission Range (125 nm–10 μm): Ideal for deep UV, visible, and IR applications.
- Low Refractive Index: Reduces need for anti-reflective coatings.
- Minimal Birefringence: Suitable for precision optical systems.
- High Laser Damage Threshold: Critical for high-power laser optics.
- Excellent Chemical Inertness: Resistant to water, many acids, and most solvents.
- Thermal and Mechanical Stability: Supports use in demanding environments.
- Low Absorption in UV and IR: Maximizes optical throughput.
- Compatibility with Epitaxial Growth: Suitable for specialized semiconductor processes (e.g., GaN on CaF₂ substrates).
- Low Scattering and High Surface Quality: Essential for high-resolution optical systems.
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- High Melting Point: CaO has a melting point of around 2572°C, making it ideal for applications requiring heat resistance.
- Thermal Stability: The material offers excellent performance in high-temperature environments, making it suitable for industrial and aerospace uses.
- Good Optical Properties: CaO is transparent over a broad spectrum, from UV to visible light, which makes it useful in various optical applications.
- Chemical Stability: CaO thin films offer strong resistance to corrosion, enhancing the longevity of coatings in harsh environments.
- High Density: The material has a density of about 3.34 g/cm³, providing robustness in thin-film applications.
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- Biocompatibility: Safe for use in medical applications.
- Bioactivity: Promotes cell growth and bone regeneration.
- High Purity: Ensures consistent performance in sensitive applications.
- Customizable Options: Available in various sizes and compositions to meet specific project needs.
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- Excellent Thermal Stability: Maintains crystal integrity at high operating temperatures.
- Good Chemical Resistance: Resists degradation in acidic and basic environments.
- Low Lattice Mismatch: Ideal for the epitaxial growth of complex oxides and superconducting films.
- High Mechanical Strength: Reduces risk of cracking during processing and device operation.
- Superior Surface Quality: Supports high-quality thin film deposition.
- Perovskite-like Structure: Compatible with a broad range of oxide thin films.
- Stable Optical Properties: Suitable for use in optical communication and laser components.
