Showing 13–15 of 15 results

  • MnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan MaterialsMnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan Materials

    MnO2 (Manganese Dioxide) Sputtering Target

    • High Purity: Available in high-purity grades, ensuring clean and efficient thin-film deposition with minimal contamination.
    • Good Electrochemical Properties: MnO₂ thin films are known for their excellent electrochemical behavior, making them ideal for energy storage applications.
    • Thermal Stability: MnO₂ exhibits stability at high temperatures, making it suitable for thin-film processes that require heat resistance.
    • Wide Range of Applications: The material is versatile, with applications ranging from energy storage and catalysis to optical coatings and sensors.
  • MnTe Sputtering Targets 99.9%-99.9999% High Purity Manganese Telluride Sputtering Target 3N-6N Customized - Tinsan Materials

    MnTe (Manganese Telluride) Sputtering Targets

    • Semiconducting Properties: MnTe exhibits semiconductor behavior, making it suitable for a variety of electronic and optoelectronic applications.
    • Magnetic Properties: With ferromagnetic behavior, MnTe is essential for applications in spintronics and magnetic sensors.
    • Thermoelectric Efficiency: The material has promising thermoelectric properties, offering potential in energy harvesting and cooling applications.
    • High Purity: MnTe sputtering targets are available in high-purity grades, ensuring the production of clean, high-performance thin films.
    • Chemical Stability: MnTe thin films offer chemical stability in various environments, which is critical for long-lasting and reliable device performance.
  • SrMnO3 Sputtering Targets 3N-6N High Purity Strontium Manganite Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    SrMnO3 (Strontium Manganite) Sputtering Targets

    • High Purity: Ensures low contamination and high film integrity.
    • Superior Density: Achieves consistent sputtering performance and uniform thin films.
    • Customizable Specifications: Available in various sizes, shapes, and densities.
    • Excellent Thermal Stability: Withstands high temperatures for advanced applications.
    • Wide Compatibility: Suitable for different sputtering systems.