Showing all 6 results

  • Fe3P Pellets Evaporation Materials 3N-6N High Purity Iron Phosphide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Fe3P (Iron Phosphide) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Exceptional magnetic and chemical stability.
    • Uniform pellet size for precise and consistent applications.
    • Customizable sizes and specifications.
    • Excellent thermal resistance and mechanical stability.
  • Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) Sputtering Targets 3N-6N High Purity HAP Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsHydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) Sputtering Targets 3N-6N High Purity HAP Ceramic Sputtering Target High Pure 99.9%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) HAP Sputtering Targets

    • Biocompatibility: Safe for use in medical applications.
    • Bioactivity: Promotes cell growth and bone regeneration.
    • High Purity: Ensures consistent performance in sensitive applications.
    • Customizable Options: Available in various sizes and compositions to meet specific project needs.
  • InP Pellets Evaporation Materials 3N-7N High Purity Indium Phosphide Granules Particles for Thin Film Deposition High Pure 99.9%-99.99999% Customized - Tinsan MaterialsInP Pellets Evaporation Materials 3N-7N High Purity Indium Phosphide Granules Particles for Thin Film Deposition High Pure 99.9%-99.99999% Customize - Tinsan Materials

    InP (Indium Phosphide) Pellets Granules Evaporation Materials

    • Ultra-high purity (≥99.99%).
    • Exceptional electronic and optical properties.
    • Uniform pellet size for consistent thin-film deposition.
    • Customizable sizes and specifications.
    • Excellent thermal stability and chemical resistance.
  • KTP (Potassium Titanyl Phosphate) Crystals - Tinsan MaterialsPotassium Titanyl Phosphate KTP Crystals - Tinsan Materials

    KTP (Potassium Titanyl Phosphate) Crystals

    • High Nonlinear Optical Coefficient: ~15 times that of KDP crystals.
    • Broad Transparency Range: 350 nm to 4500 nm.
    • High Damage Threshold: >500 MW/cm² for nanosecond pulses.
    • Excellent Electro-optic Properties: Suitable for Q-switching and Pockels cells.
    • Large Angular Acceptance and Low Walk-off Angle: Easier beam alignment and higher conversion efficiency.
    • Stable Physical and Chemical Properties: High mechanical strength and environmental stability.
  • Li3PO4 Sputtering Targets 3N-6N High Purity Lithium Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Li3PO4 (Lithium Phosphate) Sputtering Targets

    • High Purity: Guarantees low contamination for critical applications.
    • Chemical Stability: Resistant to degradation, ensuring durable coatings.
    • Superior Ionic Conductivity: Optimal for battery and energy storage films.
    • Consistent Deposition: Ensures uniform and reliable thin-film performance.
    • Customizable Dimensions: Adaptable to different sputtering systems and requirements.
  • LiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    LiFePO4 (Lithium Iron Phosphate) Sputtering Targets

    • High Purity: Ensures minimal impurities, delivering superior film quality.
    • Thermal Stability: Provides consistent performance under varying conditions.
    • Safety Profile: Stable chemistry reduces risks of thermal runaway.
    • Customizable Dimensions: Tailored to fit a range of sputtering systems.
    • Reliable Deposition: Delivers uniform and high-quality thin films.