Aluminum Sputtering Target 99.999% (5N) – 50.8 mm Diameter | Thickness 3mm / 3.175mm / 4mm / 5mm / 6mm / 6.35 mm & Magnetic Spacer Option | Custom Sizes Available

$80.00$105.00

  • Ultra-high purity 99.999% (5N), ensuring exceptional thin film quality and low impurity levels.
  • Excellent sputtering performance, providing uniform film deposition and stable sputter rates.
  • Multiple standard thickness options, including 6 mm with magnetic spacer for systems requiring enhanced magnetic coupling.
  • High density and strong mechanical stability suitable for high-power sputtering systems.
  • Customizable dimensions to match different sputtering equipment and process conditions.

Custom products or bulk orders, please contact us for competitive pricing!

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Description

Our 99.999% (5N) Aluminum Sputtering Target is designed for high-performance thin film deposition, including PVD coating, semiconductor processing, and optical applications.

This product is supplied in a 50.8 mm diameter with multiple available thicknesses: 3 mm, 3.175 mm, 4 mm, 5 mm, 6 mm, 6.35 mm, as well as an option with a 6 mm thickness + magnetic spacer.

For customers with special system requirements, we offer full customization of purity, diameter, thickness, shape, and bonding configurations.

Technical Specifications

Product Name Aluminum Sputtering Target
Chemical Formula Al
Purity 99.999% (5N); customizable 4N–6N5
Size Dia. 50.8 x 3 mm Thickness, Dia. 50.8 x 3.175 mm Thickness, Dia. 50.8 x 4 mm Thickness, Dia. 50.8 x 5 mm Thickness, Dia. 50.8 x 6 mm Thickness, Dia. 50.8 x 6.35 mm Thickness (custom size available)
Density 2.70 g/cm³
Shape Round target (rectangular, square, and special shapes available)
Backing Plate Options Mo / Cu / SS bonding available upon request
Packaging Vacuum-sealed, moisture-proof protective packaging

 

Key Features

  • Ultra-high purity 99.999% (5N), ensuring exceptional thin film quality and low impurity levels.
  • Excellent sputtering performance, providing uniform film deposition and stable sputter rates.
  • Multiple standard thickness options, including 6 mm with magnetic spacer for systems requiring enhanced magnetic coupling.
  • High density and strong mechanical stability suitable for high-power sputtering systems.
  • Customizable dimensions to match different sputtering equipment and process conditions.

Applications

  • Semiconductor and microelectronics thin film deposition
  • Optical coatings and reflective layers
  • Solar cell and photovoltaic device fabrication
  • R&D laboratories and university research
  • Decorative and functional metal coatings
  • Surface engineering and protective films

Customization Options

Tinsan Materials support comprehensive customization to meet various PVD system requirements:

  • Custom Purity Levels:
    • 4N (99.99%)
    • 4N5 (99.995%)
    • 5N (99.999%)
    • 6N (99.9999%)
  • Custom Diameters:
    • Standard: 25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80 mm, 100 mm, 101.6 mm
    • Custom diameter available
  • Custom Thickness:
    • From 1 mm to 20+ mm, depending on customer specifications
  • Custom Shape:
    • Round, rectangular, square, or complex geometries
  • Magnetic Backing & Bonding:
    • Optional magnetic spacer
    • Bonding to Mo / Cu / SS backing plates

Ordering & Technical Support

We provide flexible minimum order quantities, competitive pricing, and worldwide delivery. For custom specifications or technical inquiries, please feel free to contact us for a detailed consultation or email us at info@nbsvip.com.

Additional information

Weight N/A
PURITY

99.999%

DIAMETER

50.8mm

THICKNESS

3mm, 3.175mm, 4mm, 5mm, 6mm, 6.35mm, 6mm with magnetic spacer