Aluminum Sputtering Target 99.999% (5N) – 50.8 mm Diameter | Thickness 3mm / 3.175mm / 4mm / 5mm / 6mm / 6.35 mm & Magnetic Spacer Option | Custom Sizes Available
$80.00 – $105.00
- Ultra-high purity 99.999% (5N), ensuring exceptional thin film quality and low impurity levels.
- Excellent sputtering performance, providing uniform film deposition and stable sputter rates.
- Multiple standard thickness options, including 6 mm with magnetic spacer for systems requiring enhanced magnetic coupling.
- High density and strong mechanical stability suitable for high-power sputtering systems.
- Customizable dimensions to match different sputtering equipment and process conditions.
Custom products or bulk orders, please contact us for competitive pricing!
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Description
Our 99.999% (5N) Aluminum Sputtering Target is designed for high-performance thin film deposition, including PVD coating, semiconductor processing, and optical applications.
This product is supplied in a 50.8 mm diameter with multiple available thicknesses: 3 mm, 3.175 mm, 4 mm, 5 mm, 6 mm, 6.35 mm, as well as an option with a 6 mm thickness + magnetic spacer.
For customers with special system requirements, we offer full customization of purity, diameter, thickness, shape, and bonding configurations.
Technical Specifications
| Product Name | Aluminum Sputtering Target |
| Chemical Formula | Al |
| Purity | 99.999% (5N); customizable 4N–6N5 |
| Size | Dia. 50.8 x 3 mm Thickness, Dia. 50.8 x 3.175 mm Thickness, Dia. 50.8 x 4 mm Thickness, Dia. 50.8 x 5 mm Thickness, Dia. 50.8 x 6 mm Thickness, Dia. 50.8 x 6.35 mm Thickness (custom size available) |
| Density | 2.70 g/cm³ |
| Shape | Round target (rectangular, square, and special shapes available) |
| Backing Plate Options | Mo / Cu / SS bonding available upon request |
| Packaging | Vacuum-sealed, moisture-proof protective packaging |
Key Features
- Ultra-high purity 99.999% (5N), ensuring exceptional thin film quality and low impurity levels.
- Excellent sputtering performance, providing uniform film deposition and stable sputter rates.
- Multiple standard thickness options, including 6 mm with magnetic spacer for systems requiring enhanced magnetic coupling.
- High density and strong mechanical stability suitable for high-power sputtering systems.
- Customizable dimensions to match different sputtering equipment and process conditions.
Applications
- Semiconductor and microelectronics thin film deposition
- Optical coatings and reflective layers
- Solar cell and photovoltaic device fabrication
- R&D laboratories and university research
- Decorative and functional metal coatings
- Surface engineering and protective films
Customization Options
Tinsan Materials support comprehensive customization to meet various PVD system requirements:
- Custom Purity Levels:
- 4N (99.99%)
- 4N5 (99.995%)
- 5N (99.999%)
- 6N (99.9999%)
- Custom Diameters:
- Standard: 25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80 mm, 100 mm, 101.6 mm
- Custom diameter available
- Custom Thickness:
- From 1 mm to 20+ mm, depending on customer specifications
- Custom Shape:
- Round, rectangular, square, or complex geometries
- Magnetic Backing & Bonding:
- Optional magnetic spacer
- Bonding to Mo / Cu / SS backing plates
Ordering & Technical Support
We provide flexible minimum order quantities, competitive pricing, and worldwide delivery. For custom specifications or technical inquiries, please feel free to contact us for a detailed consultation or email us at info@nbsvip.com.
Additional information
| Weight | N/A |
|---|---|
| PURITY | 99.999% |
| DIAMETER | 50.8mm |
| THICKNESS | 3mm, 3.175mm, 4mm, 5mm, 6mm, 6.35mm, 6mm with magnetic spacer |










