Gd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials
Gd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

Gd2O3 (Gadolinium Oxide) Sputtering Target

  • High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
  • Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
  • High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
  • Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.

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Description

Material Gd2O3
Purity 99.9% – 99.9999% / 3N 3N5 4N 4N5 5N 5N5 6N
Shape disc, plate, sheet, rod, customized
Size can be customized (contact us)
Package vacuum bag or customer’s request
Place of Origin China
MOQ 1pcs
Supply Ability 10000pcs per month
Lead Time Qty: 1-100, Time: 3-10 days

Qty: >100, Time: to be negotiated

 

Gadolinium Oxide (Gd₂O₃) sputtering targets are used for the production of thin films in a variety of advanced technological applications. Gd₂O₃ is a rare earth oxide with unique magnetic, optical, and dielectric properties, making it useful in industries such as electronics, photonics, and biomedical devices.

Key Applications:

  • Semiconductors: Gd₂O₃ thin films are used as high-k dielectric materials in semiconductor devices, improving insulation and performance in transistors and integrated circuits.
  • Magnetic Materials: Gd₂O₃ films are employed in spintronics and magnetic devices due to their magnetic properties, making them suitable for memory storage applications.
  • Optoelectronics: Gadolinium oxide is used in optical coatings, lasers, and scintillators, benefiting from its transparency in the infrared (IR) range and excellent refractive index.
  • Biomedical Devices: Gd₂O₃ is explored in medical imaging, particularly in magnetic resonance imaging (MRI), where gadolinium-based contrast agents enhance image quality.
  • Luminescent Materials: Gd₂O₃ thin films are used in phosphors and other luminescent materials for display technologies and lighting applications.

Features of Gd₂O₃ Sputtering Targets:

  • High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
  • Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
  • High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
  • Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.

Customization Options:

  • Target Sizes: Available in various sizes and shapes to meet specific sputtering system requirements.
  • Purity Levels: High-purity Gd₂O₃ sputtering targets tailored to ensure superior film quality for critical applications.
  • Bonding Services: Gd₂O₃ targets can be bonded to backing plates for better heat management during sputtering.

Tinsan Materials offers high-purity Gd₂O₃ (Gadolinium Oxide) sputtering targets for thin film deposition in semiconductors, magnetic devices, and optoelectronics. Gd₂O₃ films provide excellent dielectric and magnetic properties for advanced technological applications.

If you have specific requirements, such as dimensions, purity, or application details, please contact us to match your needs.

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