Aluminum Sputtering Target 99.999% (5N) – 25.4 mm Diameter | Thickness 3 mm / 4 mm / 5 mm / 6 mm | Custom Sizes Available
$51.00 – $96.00
- Ultra-high purity 5N (99.999%) for superior film uniformity and low defect density.
- Excellent sputtering performance with stable deposition rates.
- Low impurity levels meeting research-grade and semiconductor-grade requirements.
- Standard sizes in stock for fast delivery.
- Fully customizable in purity, diameter, thickness, and shape.
Custom products or bulk orders, please contact us for competitive pricing!
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- No Hassle Refunds
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Description
Our 99.999% (5N) High Purity Aluminum Sputtering Target is designed for high-performance thin film deposition, including PVD sputtering, vacuum coating, optical coatings, and semiconductor processing.
We support full customization of purity, diameter, thickness, and shape, making the product suitable for both research laboratories and industrial production lines.
Technical Specifications
| Product Name | Aluminum Sputtering Target |
| Chemical Formula | Al |
| Purity | 99.999% (5N); customizable 4N–6N5 |
| Size | Dia. 25.4 x 3 mm Thickness, Dia. 25.4 x 4 mm Thickness, Dia. 25.4 x 5 mm Thickness, Dia. 25.4 x 6 mm Thickness (custom size available) |
| Density | 2.70 g/cm³ |
| Shape Options | Round target (rectangular, square, and special shapes available) |
| Packaging | Vacuum-sealed, moisture-proof protective packaging |
Key Features
- Ultra-high purity 5N (99.999%) for superior film uniformity and low defect density.
- Excellent sputtering performance with stable deposition rates.
- Low impurity levels meeting research-grade and semiconductor-grade requirements.
- Standard sizes in stock for fast delivery.
- Fully customizable in purity, diameter, thickness, and shape.
Applications
- PVD sputtering and thin film deposition
- Optical coatings (reflective, protective layers)
- Semiconductor device fabrication
- Display technology and conductive layers
- Solar cells and energy materials research
- R&D laboratories and university research projects
Customization Options
Tinsan Materials can produce Aluminum sputtering targets according to your exact requirements:
- Purity: 4N, 4N5, 5N, 5N5, 6N, 6N5
- Diameter: customizable according to customer requirements
- Thickness: customizable according to equipment requirements
- Shape: round, rectangular, square, or non-standard geometries
- Back plates and bonding: available upon request
Ordering & Technical Support
We provide flexible minimum order quantities, competitive pricing, and worldwide delivery. For custom specifications or technical inquiries, please feel free to contact us for a detailed consultation or email us at info@nbsvip.com.
Additional information
| Weight | N/A |
|---|---|
| PURITY | 99.999% |
| DIAMETER | 25.4mm |
| THICKNESS | 3mm, 4mm, 5mm, 6mm |









