Silicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm | Custom Thickness & Size Options

Description

Our 99.999% (5N) P-Type Silicon Sputtering Targets are manufactured for high-performance thin film deposition used in semiconductors, photovoltaic devices, microelectronics, and optical coatings.

We offer four standard diameters—25.4 mm, 50mm, 50.8 mm, 60mm, 76.2 mm, 80mm, 100mm, and 101.6 mm—with 3 mm, 4 mm, 5 mm, 6 mm, and 6.35mm thickness options (listed thicknesses will display corresponding prices).

Customized purity, diameter, doping concentration, thickness, and shapes are also available to meet specific R&D and production requirements.

Technical Specifications

Product Name	P-Type Silicon Sputtering Target
Chemical Formula	Si
Purity	99.999% (5N), custom options up to 6N
Conductivity Type	P-Type (Boron-doped as default; other dopants available)
Standard Diameters	25.4 mm, 50 mm, 50.8 mm, 60 mm, 76.2 mm, 80 mm, 100 mm, 101.6 mm (custom diameter available)
Standard Thicknesses	3 mm, 4 mm, 5 mm, 6 mm, 6.35 mm (custom thickness available)
Density	2.33 g/cm³
Shape Options	Round target (rectangular, square, and custom shapes available)
Packaging	Vacuum-sealed, anti-static, moisture-proof, and shock-protected

 

Key Features

• Ultra-high purity 5N Silicon ensures extremely low impurity levels and superior thin-film quality.
• Stable p-type electrical conductivity ideal for semiconductor and solar applications.
• Excellent sputtering uniformity with minimal particle generation.
• Multiple standard diameters in stock for fast order fulfillment.
• Fully customizable target dimensions, purity, and doping concentration.

Applications

• Semiconductor device fabrication (p-type layers)
• Thin-film deposition for ICs and microelectronics
• Solar cell manufacturing (P-type silicon layers)
• Optical coatings and dielectric layers
• MEMS and sensor development
• R&D laboratories and university research

Customization Options

We provide tailored silicon sputtering targets according to customer requirements:

• Purity Customization:
  • 4N (99.99%)
  • 4N5 (99.995%)
  • 5N (99.999%)
  • 6N (99.9999%)
• Diameter Customization
  • Standard: 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm
  • Available custom diameters: 10–300 mm
• Thickness Customization
  • Standard: 3 / 4 / 5 / 6 / 6.35 mm
  • Custom thickness available upon request
• Doping Customization
  • Boron (B) – standard p-type dopant
  • Aluminum (Al), Gallium (Ga), Indium (In) available on request
  • Tunable resistivity and dopant concentration
• Shape & Bonding Options
  • Round, rectangular, square, or special shapes
  • Bonding to backing plates (Mo, Cu, SS) for high-power sputtering systems

Ordering & Technical Support

We provide flexible minimum order quantities, competitive pricing, and worldwide delivery. For custom specifications or technical inquiries, please feel free to contact us for a detailed consultation or email us at info@nbsvip.com.