Showing 469–480 of 674 results

  • Sc2O3 Powder 3N-6N High Purity Scandium Oxide Nanopowder Nano Powder Nanoparticles High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sc2O3 (Scandium Oxide) Powder

    • High Purity: Ensures superior performance in sensitive applications.
    • Thermal Stability: Maintains stability at high temperatures.
    • Exceptional Optical Properties: High transparency in the UV and IR spectra.
    • Low Thermal Expansion: Ideal for use in advanced ceramics.
    • Customizable Particle Sizes: Nano and micrometer scales available.
    • Excellent Chemical Resistance: Resists degradation in harsh environments.
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  • Sc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSc2O3 Sputtering Target 3N-6N High Purity Scandium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sc2O3 (Scandium Oxide) Sputtering Target

    • High Dielectric Constant: Sc₂O₃ is known for its high dielectric constant, making it useful in capacitors and semiconductor devices.
    • Thermal Stability: Sc₂O₃ maintains its properties even at elevated temperatures, making it suitable for harsh environments.
    • Optical Transparency: Sc₂O₃ is transparent across a wide range of wavelengths, from UV to IR, which is beneficial in optical coatings and devices.
    • Corrosion Resistance: Sc₂O₃ thin films are highly resistant to chemical corrosion, enhancing the longevity of coated surfaces.
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  • Sc2O3 Pellets Evaporation Materials 3N-6N High Purity Scandium(III) Oxide Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Sc2O3 (Scandium(III) Oxide) Pellets Granules Evaporation Materials

    • Ultra-high purity (≥99.9%).
    • Superior thermal and chemical stability.
    • Precise dimensions for uniform deposition.
    • Customizable sizes and shapes available.
    • Wide application in advanced technology industries.
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  • Selenium Granules Evaporation Material 3N-6N High Purity Se Powder Rods for Coating High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSelenium Lump Evaporation Material 3N-6N High Purity Se Pellets Rods for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Se Selenium Granules Powder Evaporation Materials 3N – 6N (99.9% – 99.9999%)

    • Photoconductive Properties: Selenium changes its electrical conductivity when exposed to light, making it essential for optoelectronic devices such as photodetectors and xerography.
    • Semiconductor Capabilities: Selenium is a key element in semiconductor applications, offering high photoelectric sensitivity and versatility in electronic components.
    • High Purity: Selenium evaporation materials are typically offered in high-purity levels (≥ 99.9%) for optimal thin-film deposition and consistent results.
    • Compatibility with PVD Techniques: Selenium pellets can be easily evaporated using thermal or electron-beam evaporation, providing stable and uniform thin films.
    • Infrared Optics: Selenium-based compounds, like cadmium selenide (CdSe), are used in infrared detectors and imaging technologies due to their IR transparency.
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  • Selenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsSelenium Sputtering Target 99.9%-99.9999% High Purity Se Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Se Selenium Sputtering Targets

    • Purity: High-purity selenium (typically 99.9% or higher) ensures the quality of the deposited films and consistent performance.
    • Photoconductivity: Selenium is highly photoconductive, making it ideal for optoelectronic and photovoltaic applications.
    • Customizable Size and Shape: Selenium sputtering targets are available in different forms, including discs, plates, and custom shapes, to fit a variety of PVD systems.
    • Thermal and Electrical Properties: Selenium films offer excellent thermal and electrical properties, crucial for semiconductor and photovoltaic devices.
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  • Silicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customized - Tinsan MaterialsSilicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customize - Tinsan Materials

    Si Silicon Granules 3N – 7N (99.9% – 99.99999%) Pellets (Intrinsic/N-Type/P-Type)

    $10.00 – $335.00
    • High Purity: Silicon pellets typically have a purity of ≥ 99.9%, ensuring high-quality thin-film deposition with minimal contamination.
    • Semiconductor Properties: Silicon’s intrinsic semiconducting properties make it crucial for electronic and optoelectronic applications.
    • Thermal Stability: Silicon can withstand high temperatures during deposition, providing stable and uniform films.
    • Infrared Transparency: Silicon exhibits excellent transparency in the infrared (IR) range, making it suitable for IR optics and coatings.
    • Easy Evaporation: Silicon pellets are easily evaporated using thermal or electron-beam evaporation techniques, allowing for precise control in thin-film deposition.
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  • Silicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan MaterialsSilicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan Materials

    Si Silicon Sputtering Targets (Intrinsic/N-Type/P-Type)

    • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
    • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
    • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
    • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.
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  • Si2Te3 Sputtering Targets 2N5-6N High Purity Silicon Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Si2Te3 (Silicon Telluride) Sputtering Targets

    • High Purity: Ensures minimal contamination and consistent deposition performance.
    • Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
    • Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
    • Excellent Film Properties: Supports the production of uniform, high-quality thin films.
    • Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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  • Si3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Si3N4 (Silicon Nitride) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Outstanding thermal and mechanical stability.
    • Uniform pellet size for precise deposition.
    • Customizable sizes and specifications.
    • Superior resistance to oxidation, corrosion, and wear.
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  • Si3N4 Powder 2N-5N High Purity Silicon Nitride Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Powder

    • High Purity: Purity levels up to 99.999% for critical applications.
    • Superior Mechanical Strength: Exceptional hardness and fracture toughness.
    • Thermal Stability: Outstanding resistance to thermal shock and high-temperature environments.
    • Chemical Resistance: Resistant to oxidation, corrosion, and chemical reactions.
    • Low Thermal Expansion: Ideal for applications requiring dimensional stability.
    • Customizable Particle Sizes: Nano and micron sizes to fit diverse applications.
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  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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  • SiC Pellets Evaporation Material 3N-6N High Purity Silicon Carbide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Pellets Granules Evaporation Materials

    • High Hardness: SiC is one of the hardest materials available, making it ideal for protective coatings and abrasive applications.
    • High Thermal Conductivity: SiC efficiently dissipates heat, making it suitable for high-temperature coatings in optical and electronic devices.
    • Chemical Stability: SiC is highly resistant to corrosion and oxidation, which is beneficial for coatings in harsh environments.
    • Wide Bandgap: In electronics, SiC thin films enable higher efficiency in power management and thermal resistance.
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