Showing 493–504 of 696 results

  • Si3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Si3N4 (Silicon Nitride) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Outstanding thermal and mechanical stability.
    • Uniform pellet size for precise deposition.
    • Customizable sizes and specifications.
    • Superior resistance to oxidation, corrosion, and wear.
    Read moreDone
  • Si3N4 Powder 2N-5N High Purity Silicon Nitride Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Powder

    • High Purity: Purity levels up to 99.999% for critical applications.
    • Superior Mechanical Strength: Exceptional hardness and fracture toughness.
    • Thermal Stability: Outstanding resistance to thermal shock and high-temperature environments.
    • Chemical Resistance: Resistant to oxidation, corrosion, and chemical reactions.
    • Low Thermal Expansion: Ideal for applications requiring dimensional stability.
    • Customizable Particle Sizes: Nano and micron sizes to fit diverse applications.
    Read moreDone
  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
    Read moreDone
  • SiC Pellets Evaporation Material 3N-6N High Purity Silicon Carbide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Pellets Granules Evaporation Materials

    • High Hardness: SiC is one of the hardest materials available, making it ideal for protective coatings and abrasive applications.
    • High Thermal Conductivity: SiC efficiently dissipates heat, making it suitable for high-temperature coatings in optical and electronic devices.
    • Chemical Stability: SiC is highly resistant to corrosion and oxidation, which is beneficial for coatings in harsh environments.
    • Wide Bandgap: In electronics, SiC thin films enable higher efficiency in power management and thermal resistance.
    Read moreDone
  • SiC Powder 2N-5N High Purity Silicon Carbide Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Powder

    • Exceptional Hardness: Mohs hardness of 9.2, ideal for abrasives and wear-resistant applications.
    • Thermal Resistance: Stable in high-temperature environments up to 2,700°C.
    • High Thermal Conductivity: Efficient heat transfer for thermal management.
    • Chemical Inertness: Resistant to corrosion and oxidation in harsh conditions.
    • Customizable Particle Sizes: Nano and micron sizes for specialized applications.
    • Eco-friendly: Minimal environmental impact during use.
    Read moreDone
  • SiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SiC (Silicon Carbide) Sputtering Targets

    • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
    • Chemical Resistance: Resilient to corrosive environments.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
    Read moreDone
  • Silicon Carbide (SiC) Substrates - Tinsan MaterialsSilicon Carbide SiC Substrates - Tinsan Materials

    Silicon Carbide (SiC) Substrates

    • Wide bandgap (3.2 eV for 4H-SiC)
    • High thermal conductivity (~4.9 W/cm·K)
    • Excellent chemical resistance
    • High voltage breakdown strength
    • Radiation hardness
    • Suitable for GaN-on-SiC and epitaxial SiC device growth
    Read moreDone
  • Silicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 50 50.8 60 76.2 100 101.6 mm Custom Sizes & Thickness Options - Tinsan MaterialsSilicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 50 50.8 60 76.2 80 100 101.6 mm Custom Sizes & Thickness Options - Tinsan Materials

    Silicon Sputtering Target 99.999% (5N) N-Type – Diameters 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm | Custom Sizes & Thickness Options

    $46.00 – $200.00
    • Ultra-high purity 5N (99.999%) for superior thin-film quality and minimal contamination.
    • Stable electrical properties due to controlled N-type doping.
    • Excellent sputtering performance with uniform deposition and low particle generation.
    • Available in multiple diameters for different PVD systems.
    • Customizable in purity, doping type, diameter, thickness, and bonding options.
    Select optionsDone This product has multiple variants. The options may be chosen on the product page
  • Silicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 50 50.8 60 76.2 80 100 101.6 mm Custom Thickness & Size Options - Tinsan MaterialsSilicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 50.8 60 76.2 80 100 101.6 mm Custom Thickness & Size Options - Tinsan Materials

    Silicon Sputtering Target P-Type 99.999% (5N) – Diameters 25.4 / 50 / 50.8 / 60 / 76.2 / 80 / 100 / 101.6 mm | Custom Thickness & Size Options

    $46.00 – $200.00
    • Ultra-high purity 5N Silicon ensures extremely low impurity levels and superior thin-film quality.
    • Stable p-type electrical conductivity ideal for semiconductor and solar applications.
    • Excellent sputtering uniformity with minimal particle generation.
    • Multiple standard diameters in stock for fast order fulfillment.
    • Fully customizable target dimensions, purity, and doping concentration.
    Select optionsDone This product has multiple variants. The options may be chosen on the product page
  • SiO Pellets Evaporation Material 3N-6N High Purity Silicon Monoxide Granules Particles for Coating High Pure 99.9%-99.9999% Customize - Tinsan MaterialsSiO Pellets Evaporation Material 3N-6N High Purity Silicon Monoxide Granules Particles for Coating High Pure 99.9%-99.9999% Customized From Tinsan Materials

    SiO (Silicon Monoxide) Pellets Granules Evaporation Materials

    • High Purity: SiO pellets are typically manufactured with a purity of 99.9% or higher to ensure high-quality film deposition.
    • Transparency in UV and Visible Range: SiO has good transmission properties in both the UV and visible light spectrum, making it suitable for optical applications.
    • Hard and Durable Coating: Coatings formed from SiO are known for their hardness and durability, providing a protective layer for sensitive optical and electronic devices.
    • Excellent Adhesion: SiO films exhibit strong adhesion to substrates, which is crucial for long-lasting coatings.
    Read moreDone
  • SiO Powder 2N5-5N High Purity Silicon Monoxide Nanopowder Nano Powder Nanoparticles High Pure 99.5%-99.999% Customized - Tinsan Materials

    SiO (Silicon Monoxide) Powder

    • High Purity: ≥99.5% for reliable performance in critical applications.
    • Excellent Optical Properties: Ideal for thin-film optical coatings.
    • Thermal Stability: Performs well in high-temperature environments.
    • Versatile Particle Sizes: Available in nano and micron scales.
    • Low Oxygen Deficiency: Ensures consistency in applications.
    • Energy Storage Compatibility: Suitable for advanced battery systems.
    Read moreDone
  • SiO Sputtering Targets 3N-6N High Purity Silicon Monoxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    SiO (Silicon Monoxide) Sputtering Targets

    • High Purity: Ensures superior film quality and consistent performance.
    • Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
    • Stable and Durable: High thermal and chemical stability for demanding processes.
    • Customizable Options: Available in various sizes, purities, and configurations.
    Read moreDone