Showing 109–120 of 251 results

  • LiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiCoO2 (Lithium Cobalt Oxide) Sputtering Target

    • High Energy Density: LiCoO₂ has a high theoretical energy density, making it an ideal material for battery cathodes, especially in high-performance applications like electric vehicles and portable electronics.
    • Stable Structure: The layered crystal structure of LiCoO₂ contributes to its stable electrochemical performance, which is crucial for the long-term operation of lithium-ion batteries.
    • Excellent Cycling Performance: LiCoO₂ can undergo many charge and discharge cycles without significant degradation, ensuring reliable performance in rechargeable battery systems.
    • Thin Film Deposition: LiCoO₂ sputtering targets allow for the precise deposition of thin films in applications requiring uniform coatings, such as in thin-film batteries and microelectronics.
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  • LiF Sputtering Target 3N-6N High Purity Lithium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiF (Lithium Fluoride) Sputtering Target

    • High Optical Transparency: LiF has high optical transparency in the UV, visible, and infrared regions, making it an excellent material for optical coatings and components.
    • Wide Bandgap: LiF has a wide bandgap (~13.6 eV), which makes it an excellent insulating material in electronic and optoelectronic applications.
    • Low Absorption: LiF thin films exhibit low absorption across a broad spectral range, making them ideal for applications where minimal light loss is required.
    • Chemical Stability: LiF is chemically stable and resistant to moisture, which contributes to its durability in harsh environments and long-lasting performance in thin-film coatings.
    • Insulating Properties: LiF has excellent insulating properties, which are beneficial for electronic and optoelectronic devices where electrical isolation is needed.
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  • LiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    LiFePO4 (Lithium Iron Phosphate) Sputtering Targets

    • High Purity: Ensures minimal impurities, delivering superior film quality.
    • Thermal Stability: Provides consistent performance under varying conditions.
    • Safety Profile: Stable chemistry reduces risks of thermal runaway.
    • Customizable Dimensions: Tailored to fit a range of sputtering systems.
    • Reliable Deposition: Delivers uniform and high-quality thin films.
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  • LiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiNbO3 (Lithium Niobate) Sputtering Target

    $1.00 – $595.00
    • High Electro-optic Coefficient: LiNbO₃ has a high electro-optic coefficient, enabling efficient modulation of light in waveguides, modulators, and telecommunications devices.
    • Excellent Piezoelectric Properties: LiNbO₃’s strong piezoelectric response makes it ideal for use in SAW devices, sensors, and actuators, providing high sensitivity and control.
    • Nonlinear Optical Capabilities: LiNbO₃ is widely used for frequency conversion and other nonlinear optical applications due to its strong nonlinear optical response.
    • Ferroelectric Behavior: LiNbO₃’s ferroelectric properties are valuable in memory devices and data storage, enabling the development of non-volatile memory technologies.
    • Stable and Durable Thin Films: LiNbO₃ thin films exhibit high thermal and chemical stability, making them suitable for use in demanding environments and high-performance applications.
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  • LiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsLiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    LiTaO3 (Lithium Tantalate) Sputtering Targets

    • High Purity: Ensures minimal impurities for superior thin-film quality.
    • Exceptional Piezoelectric Properties: Ideal for high-performance acoustic and vibrational devices.
    • Stable Electro-Optic Behavior: Suitable for high-precision optical applications.
    • Customizable Specifications: Tailored to meet unique system requirements.
    • Durable and Reliable: Manufactured for consistent sputtering performance.
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  • LiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsLiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    LiV3O8 (Lithium Vanadium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film deposition.
    • Superior Electrochemical Performance: Supports high energy density and stability.
    • Customizable Options: Available in various sizes, shapes, and purity levels.
    • Durable and Stable: Delivers reliable performance in demanding environments.
    • Scalability: Suitable for both research-scale and industrial-scale applications.
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  • High Purity Manganese Selenide (MnSe) Sputtering Target 99.9% Purity Ø50.8mm

    Manganese Selenide (MnSe) Sputtering Target | Mn:Se = 1:1 at% | 99.9% Purity | Ø50.8mm

    $895.00
    • High purity: 99.9% (3N) for consistent film composition
    • Precise alloy ratio (1:1 at%) for uniform deposition
    • Indium bonding + copper backing plate for efficient heat transfer
    • Compatible with magnetron sputtering systems
    • Supports stable deposition rates & low impurity levels
    • Customizable sizes, thicknesses, and atomic ratios available
    Select optionsDone This product has multiple variants. The options may be chosen on the product page
  • Mg3Bi2 Sputtering Target 3N-6N High Purity Magnesium Bismuth Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Mg3Bi2 (Magnesium Bismuth) Sputtering Target

    • High Thermoelectric Efficiency: Magnesium Bismuth is recognized for its high Seebeck coefficient and low thermal conductivity, making it an efficient material for thermoelectric applications.
    • Low-Temperature Thermoelectrics: Mg3Bi2 is particularly effective at lower temperatures, which makes it suitable for a wide range of thermoelectric devices that operate in ambient conditions.
    • Customizable Film Properties: The thin films produced using Mg3Bi2 targets can be tailored in terms of thickness and crystallinity, allowing for optimization in various applications.
    • Chemical Stability: Magnesium Bismuth films exhibit good stability, ensuring reliable performance over time in demanding environments.
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  • MgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan MaterialsMgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan Materials

    MgF2 (Magnesium Fluoride) Sputtering Target

    • Broad Transparency Range: MgF₂ has excellent transmission across UV, visible, and IR spectra, making it an ideal material for high-performance optical coatings.
    • Low Refractive Index: The low refractive index of MgF₂ helps reduce light reflection, enabling its use in anti-reflective coatings for various optical applications.
    • High Hardness and Durability: Magnesium Fluoride films are known for their hardness and resistance to scratching, making them suitable for protective coatings in high-durability environments.
    • Chemical and Environmental Stability: MgF₂ coatings are chemically inert and stable under extreme temperature conditions, enhancing their use in both optical and electronic applications.
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  • MgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMgO Sputtering Targets 3N-6N High Purity Magnesium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MgO (Magnesium Oxide) Sputtering Targets

    • High Purity: Guarantees consistent and reliable thin-film quality.
    • Thermal Stability: Performs exceptionally under high-temperature conditions.
    • Excellent Dielectric Properties: Ideal for insulating layers in electronic devices.
    • Wide Optical Transparency: Operates effectively across UV, visible, and IR spectra.
    • Customizable Options: Available in various shapes, sizes, and specifications.
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  • Manganese Sputtering Target, 99.9%-99.999% High Purity Mn Metal Sputtering Targets CustomizedManganese Sputtering Target, 99.9%-99.999% High Purity Mn Metal Sputtering Targets Customized

    Mn Manganese Sputtering Target

    Manganese (Mn) sputtering targets are essential for industries that rely on magnetic properties, wear resistance, and corrosion resistance, making them indispensable in electronics, magnetic storage, metallurgy, and catalytic applications.

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  • MnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan MaterialsMnO2 Sputtering Target 3N-6N High Purity Manganese Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Custom - Tinsan Materials

    MnO2 (Manganese Dioxide) Sputtering Target

    • High Purity: Available in high-purity grades, ensuring clean and efficient thin-film deposition with minimal contamination.
    • Good Electrochemical Properties: MnO₂ thin films are known for their excellent electrochemical behavior, making them ideal for energy storage applications.
    • Thermal Stability: MnO₂ exhibits stability at high temperatures, making it suitable for thin-film processes that require heat resistance.
    • Wide Range of Applications: The material is versatile, with applications ranging from energy storage and catalysis to optical coatings and sensors.
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