Showing 289–300 of 687 results

  • InSb Sputtering Targets 3N-7N High Purity Indium Antimonide Ceramic Sputtering Target High Pure 99.9%-99.99999% Customized for Thin Film Deposition - Tinsan MaterialsInSb Sputtering Targets 3N-7N High Purity Indium Antimonide Ceramic Sputtering Target High Pure 99.9%-99.99999% Customize for Thin Film Deposition - Tinsan Materials

    InSb (Indium Antimonide) Sputtering Targets

    • High Purity: Ensures minimal contamination during deposition processes.
    • Excellent Infrared Performance: Optimal for devices requiring sensitivity in the infrared spectrum.
    • Uniform Film Deposition: Supports consistent and reliable thin-film production.
    • Customizable Options: Tailored shapes, sizes, and purity levels to meet specific project requirements.
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  • Ir Pellets Evaporation Materials 3N-6N High Purity Metal Iridium Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Ir Iridium Pellets Granules Evaporation Materials

    • Ultra-high purity (≥99.9%).
    • Exceptional thermal and chemical stability.
    • Excellent corrosion resistance and electrical conductivity.
    • Uniform pellet size for consistent deposition rates.
    • Customizable sizes and compositions to meet specific needs.
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  • Ir Iridium Powder 3N5-5N High Purity Iridium Nanopowder Nano Powder Nanoparticles High Pure 99.95%-99.999% Customized - Tinsan Materials

    Ir Iridium Powder

    • High Purity: ≥99.95% for reliable and consistent performance.
    • Exceptional Corrosion Resistance: Unaffected by acids and extreme environments.
    • High Melting Point: Withstands temperatures exceeding 2,400°C.
    • Chemical Inertness: Stable in various chemical environments.
    • Fine Particle Size: Customizable sizes to meet specific application needs.
    • Superior Electrical Properties: Ideal for applications requiring excellent conductivity.
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  • Iridium Sputtering Target 99.9%-99.9999% High Purity Ir Metal Sputtering Targets 3N-6N Customized - Tinsan MaterialsIridium Sputtering Target 99.9%-99.9999% High Purity Ir Metal Sputtering Targets 3N-6N Customized - Tinsan Materials

    Ir Iridium Sputtering Target

    • High Purity: Iridium sputtering targets are available in ultra-high purity (up to 99.99%) to ensure the deposition of superior thin films for sensitive electronics and optical components.
    • Thermal Stability: Iridium’s high melting point (~2446°C) makes it ideal for thin films that must withstand extreme heat in aerospace, semiconductor, and other high-temperature environments.
    • Corrosion Resistance: Iridium is one of the most corrosion-resistant metals, ensuring long-lasting films in harsh chemical environments.
    • Electrical Conductivity: Iridium thin films offer excellent electrical conductivity, making them essential for electronic applications requiring efficient current flow.
    • Customizable Size and Shape: Available in various forms, including discs, plates, and custom geometries, to fit different PVD systems.
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  • IrMn Alloy Target 99.9%-99.9999% High Purity Iridium Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    IrMn (Iridium Manganese) Alloy Target

    • Antiferromagnetic Properties: IrMn alloy thin films exhibit strong antiferromagnetic behavior, which is essential for magnetic pinning in spintronic devices and memory storage.
    • High Corrosion Resistance: Iridium provides excellent corrosion resistance, ensuring the durability and longevity of the deposited thin films, even in harsh environments.
    • Thermal Stability: IrMn alloy films are thermally stable, making them ideal for high-temperature applications in electronic and magnetic devices.
    • Customizable Size and Shape: IrMn sputtering targets are available in various sizes and shapes, including discs, plates, and custom geometries, to suit a wide range of deposition systems.
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  • ITO Pellets Evaporation Material 4N-6N High Purity Indium Tin Oxide Granules Particles for Coating High Pure 99.99%-99.9999% Customized - Tinsan Materials

    ITO (Indium Tin Oxide) Pellets Granules Evaporation Materials

    $100.00 – $780.00
    • High Electrical Conductivity: ITO films exhibit excellent electrical conductivity, allowing for efficient electron transport in devices like displays, sensors, and solar cells.
    • Optical Transparency: ITO combines electrical conductivity with high transparency in the visible spectrum, making it essential for devices that require a clear view, such as displays and touchscreens.
    • Wide Bandgap (3.5-4.3 eV): The wide bandgap of ITO makes it suitable for transparent conducting electrodes, ensuring minimal interference with visible light.
    • Durability: ITO coatings are robust and can withstand environmental stress, including UV exposure and high temperatures, ensuring long-lasting performance.
    • Customizable Conductivity and Transparency: The ratio of indium to tin can be adjusted to optimize the balance between conductivity and transparency based on the specific application needs.
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  • ITO Sputtering Target 3N-7N High Purity Indium Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan MaterialsITO Sputtering Target 3N-7N High Purity Indium Tin Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    ITO (Indium Tin Oxide) Sputtering Target

    • High Transparency and Conductivity: ITO offers a balance of excellent transparency in the visible spectrum and good electrical conductivity, making it a perfect material for applications requiring both.
    • Adjustable Stoichiometry: The ratio of In2O3 to SnO2 in ITO can be adjusted to optimize its electrical and optical properties for specific applications.
    • Thin-film Uniformity: ITO films are known for their uniform thickness and quality, essential for ensuring consistent performance across large-area coatings like touchscreens and solar panels.
    • Durability: ITO films are chemically stable and durable, providing long-term performance in various environmental conditions.
    • Custom Purity Levels: ITO sputtering targets are available in a variety of purities (up to 99.999%) to meet the stringent requirements of high-performance electronic and optical devices.
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  • IWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-film Deposition - Tinsan MaterialsIWO Sputtering Targets 3N-6N High Purity Indium Tungsten Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    IWO (Indium Tungsten Oxide) Sputtering Targets

    • High Optical Transparency: Enables the creation of efficient transparent films.
    • Superior Conductivity: Provides excellent electrical performance for electronic applications.
    • Thermal and Chemical Stability: Ensures reliability in high-temperature and reactive environments.
    • Customizable Material Composition: Optimized for specific TCO requirements.
    • Compatibility: Suitable for RF and DC sputtering systems.
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  • KTA Crystal

    KTA Crystal – Potassium Titanyl Arsenate Nonlinear Optical Crystal

    • Wide transmission range: 350–5300 nm
    • High nonlinear optical coefficients
    • Excellent electro-optic properties
    • Low absorption at 1064 nm and 1533 nm
    • Suitable for mid-IR frequency conversion
    • High laser damage threshold
    • Reduced gray-tracking effect compared with KTP
    • Chemically stable and non-hygroscopic
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  • KTN (Potassium Tantalate Niobate) Single Crystal Substrates - Tinsan MaterialsKTN (Potassium Tantalate Niobate, KTa₁₋ₓNbₓO₃) Single Crystal Substrates - Tinsan Materials

    KTN (Potassium Tantalate Niobate, KTa₁₋ₓNbₓO₃) Single Crystal Substrates

    • Exceptional Electro-Optic Performance: Extremely high electro-optic coefficients enabling high-speed modulation and tunable devices.
    • High Dielectric Constant: Useful for applications in capacitors and tunable microwave devices.
    • Wide Transparency Range: Optical transmission from near-UV (~400 nm) to mid-IR (~5.5 μm).
    • Tunable Refractive Index: Ability to electrically modulate optical properties.
    • Low Optical Absorption: High transmission and low loss across the IR and visible spectrum.
    • Precise Composition Control: Customizable Nb/Ta ratios (x values) to tailor ferroelectric and optical properties.
    • Good Chemical Stability: Suitable for long-term operation in standard laboratory environments.
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  • KTN Crystal (KTa₀.₅Nb₀.₅O₃) – 001 Orientation, 10 × 10 × 0.5 mm - Tinsan MaterialsTinsan Materials KTN Crystal (KTa₀.₅Nb₀.₅O₃) – 001 Orientation, 10 × 10 × 0.5 mm

    KTN Crystal (KTa₀.₅Nb₀.₅O₃) – <001> Orientation, 10 × 10 × 0.5 mm

    $1,285.00
    • Single crystal KTN with composition KTa₀.₅Nb₀.₅O₃
    • <001> crystallographic orientation for optimal electro-optic performance
    • Size: 10 × 10 × 0.5 mm
    • High electro-optic coefficient (r33 ≈ 30–50 pm/V)
    • Strong photorefractive effect
    • Excellent dielectric tunability
    • Wide optical transparency (~350 nm – 5500 nm)
    • Low defect density and high optical uniformity
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  • KTP (Potassium Titanyl Phosphate) Crystals - Tinsan MaterialsPotassium Titanyl Phosphate KTP Crystals - Tinsan Materials

    KTP (Potassium Titanyl Phosphate) Crystals

    • High Nonlinear Optical Coefficient: ~15 times that of KDP crystals.
    • Broad Transparency Range: 350 nm to 4500 nm.
    • High Damage Threshold: >500 MW/cm² for nanosecond pulses.
    • Excellent Electro-optic Properties: Suitable for Q-switching and Pockels cells.
    • Large Angular Acceptance and Low Walk-off Angle: Easier beam alignment and higher conversion efficiency.
    • Stable Physical and Chemical Properties: High mechanical strength and environmental stability.
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