Showing 85–96 of 171 results

  • MoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoO3 Sputtering Target 3N-6N High Purity Molybdenum Trioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoO3 (Molybdenum Trioxide) Sputtering Target

    • High Work Function: MoO₃ is known for its high work function, which makes it ideal for applications requiring efficient charge injection or extraction, such as OLEDs and OPVs.
    • Excellent Catalytic Properties: MoO₃ is a robust catalyst, especially in oxidation reactions, making it suitable for industrial chemical processes and catalytic thin films.
    • Electrochromic Behavior: MoO₃’s ability to undergo reversible oxidation-reduction reactions makes it ideal for use in electrochromic devices.
    • Optical Transparency: MoO₃ thin films can be transparent in the visible and near-infrared regions, which is beneficial for optoelectronic devices requiring transparent electrodes or coatings.
  • MoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsMoS2 Sputtering Target 3N-6N High Purity Molybdenum Disulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoS2 (Molybdenum Disulfide) Sputtering Target

    • Layered Structure: MoS2 has a unique layered structure that contributes to its mechanical, electrical, and tribological properties, making it an excellent candidate for advanced coatings and devices.
    • Semiconducting Properties: MoS2 is a semiconductor with a direct bandgap in its monolayer form, offering high performance in electronic devices such as transistors and photodetectors.
    • Low Friction Coefficient: As a solid lubricant, MoS2 provides a low friction coefficient, making it useful in harsh environments where liquid lubricants are impractical.
    • High Thermal and Chemical Stability: MoS2 films exhibit excellent thermal and chemical stability, enabling their use in high-temperature environments and chemically aggressive conditions.
  • MoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsMoSe2 Sputtering Targets 3N-6N High Purity Molybdenum Diselenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    MoSe2 (Molybdenum Diselenide) Sputtering Targets

    • High Purity: Ensures superior thin-film quality and device performance.
    • Layered Structure: Facilitates easy exfoliation and 2D material synthesis.
    • Stable Chemical Composition: Provides consistent results across various deposition processes.
    • Excellent Optical and Electrical Properties: Ideal for advanced electronics and optoelectronics.
    • Custom Configurations: Available in tailored sizes, shapes, and thicknesses for specific requirements.
  • MoSi2-Sputtering-Targets-2N5-6N-High-Purity-Molybdenum-Disilicide-Ceramic-Sputtering-Target-High-Pure-99.5-99.9999-Customized-for-Thin-film-Deposition-Tinsan-Materials

    MoSi2 (Molybdenum Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Operates efficiently in high-temperature environments.
    • High Purity Levels: Ensures superior film quality with minimal defects.
    • Oxidation Resistance: Suitable for protective coatings in harsh conditions.
    • Electrical Conductivity: Ideal for use in electronic and semiconductor applications.
    • Customizable Options: Targets tailored to specific industrial or research needs.
  • MoTe2 Sputtering Target 3N-6N High Purity Molybdenum Ditelluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoTe2 (Molybdenum Ditelluride) Sputtering Target

    • Phase Tunability: MoTe₂ can transition between semiconducting and metallic phases, offering versatility in different electronic and optoelectronic applications.
    • High Photoresponse: MoTe₂ thin films are highly responsive to light, especially in the infrared spectrum, making them ideal for photodetectors and imaging devices.
    • 2D Material Properties: As a layered material, MoTe₂ offers exceptional flexibility and mechanical properties, enabling its use in cutting-edge flexible electronics.
    • Thermoelectric Efficiency: MoTe₂ is suitable for thermoelectric applications due to its ability to efficiently convert heat into electricity.
  • Nb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsNb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nb2O5 (Niobium Pentoxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for precise thin-film deposition.
    • Excellent Stability: Chemically and thermally stable, suitable for demanding applications.
    • High Refractive Index: Ideal for optical coating applications.
    • Customizable: Available in various sizes, shapes, and configurations.
  • NbC (Niobium Carbide) Sputtering Targets

    • High Hardness: Ensures durability and wear resistance in coatings.
    • Thermal Stability: Withstands high-temperature processes without degradation.
    • Corrosion Resistance: Provides protection in harsh environments.
    • Customizable: Available in various sizes, purities, and configurations to meet specific requirements.
  • NbN Sputtering Targets 3N-5N High Purity Niobium Nitride Sputtering Target High Pure 99.9%-99.999% Customized - Tinsan Materials

    NbN Niobium Nitride Sputtering Targets

    • High Purity: NbN sputtering targets are manufactured with purity levels of up to 99.999%, ensuring excellent film consistency and performance in various deposition applications.
    • Electrical Conductivity: Known for its high electrical conductivity, NbN is used in applications requiring efficient electron flow and low resistance.
    • Thermal Stability: Niobium nitride exhibits excellent thermal stability, maintaining performance even at elevated temperatures, making it suitable for high-temperature applications.
    • Corrosion Resistance: NbN films exhibit outstanding resistance to oxidation and chemical wear, making them ideal for applications in harsh environments.
    • Uniformity in Coating: NbN sputtering targets provide excellent film uniformity and density, ensuring reliable coating processes with minimal defects.
    • Hardness: The resulting NbN films are known for their exceptional hardness, making them suitable for tough, abrasive conditions.
  • NbSe2 (Niobium Diselenide) Sputtering Targets

    • High Purity: ≥99.5% purity to ensure high-quality thin-film deposition.
    • Unique Layered Structure: Facilitates superior electronic and optical properties for advanced applications.
    • Superconducting Properties: Ideal for applications in superconducting electronics and quantum computing research.
    • High Stability: Reliable performance under sputtering conditions with excellent chemical stability.
    • Customizable: Tailored sizes and shapes for different deposition setups.
  • NbSi2 Sputtering Targets 2N5-6N High Purity Niobium Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    NbSi2 (Niobium Disilicide) Sputtering Targets

    • High Thermal Stability: Performs reliably in extreme temperatures.
    • Oxidation Resistance: Ideal for protective coatings in harsh environments.
    • Superior Mechanical Strength: Enhances the durability of deposited films.
    • High Purity Standards: Ensures film quality and minimal contamination.
    • Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
  • NbTiO3 Sputtering Target 3N-6N High Purity Niobium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NbTiO3 (Niobium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: NbTiO₃ has a high dielectric constant, making it ideal for capacitors and other electronic components requiring high energy density.
    • Ferroelectric Properties: The ferroelectric nature of NbTiO₃ enables its use in memory devices and sensors that need stable, reliable performance under varying conditions.
    • Optical Transparency: NbTiO₃ thin films provide excellent optical transparency, ensuring their application in optoelectronic devices and displays.
    • Chemical and Thermal Stability: NbTiO₃ films are highly stable in both chemical and thermal environments, ensuring long-lasting performance in demanding applications.
  • Nd2O3 Sputtering Target 3N-6N High Purity Neodymium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nd2O3 (Neodymium Oxide) Sputtering Target

    • Magnetic Properties: Neodymium oxide exhibits magnetic behavior, making it valuable in magneto-optic devices and sensors where control of magnetic fields is required.
    • Optical Transparency: Nd₂O₃ thin films offer optical transparency in the infrared range, making them ideal for optical coatings and filters in laser and photonic devices.
    • High Refractive Index: The high refractive index of Nd₂O₃ allows for efficient control of light in optical applications, especially in the IR spectrum.
    • Chemical Stability: Nd₂O₃ is highly stable in various chemical environments, ensuring durability and performance in industrial and research applications.