Showing 109–120 of 171 results
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- High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
- Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
- Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
- Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
- Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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- Exceptional Hardness: Ideal for durable, wear-resistant coatings.
- High Thermal Stability: Performs well under extreme temperatures.
- Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
- Chemical Resistance: Resilient to corrosive environments.
- Customizable Configurations: Available in various sizes, purities, and bonding options.
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$46.00 – $200.00
- Ultra-high purity 5N (99.999%) for superior thin-film quality and minimal contamination.
- Stable electrical properties due to controlled N-type doping.
- Excellent sputtering performance with uniform deposition and low particle generation.
- Available in multiple diameters for different PVD systems.
- Customizable in purity, doping type, diameter, thickness, and bonding options.
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$46.00 – $200.00
- Ultra-high purity 5N Silicon ensures extremely low impurity levels and superior thin-film quality.
- Stable p-type electrical conductivity ideal for semiconductor and solar applications.
- Excellent sputtering uniformity with minimal particle generation.
- Multiple standard diameters in stock for fast order fulfillment.
- Fully customizable target dimensions, purity, and doping concentration.
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- High Purity: Ensures superior film quality and consistent performance.
- Wide Optical Transparency: Suitable for coatings across UV, visible, and IR ranges.
- Stable and Durable: High thermal and chemical stability for demanding processes.
- Customizable Options: Available in various sizes, purities, and configurations.
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- Excellent Insulator: SiO₂ has a high dielectric strength, making it a perfect insulating material for electronic devices and integrated circuits.
- High Optical Transparency: SiO₂ is highly transparent in the UV, visible, and near-IR regions, making it suitable for optical coatings and protective layers.
- Chemical Stability: SiO₂ exhibits strong chemical resistance, ensuring that deposited films are durable and stable under harsh environmental conditions.
- Thermal Stability: Silicon Dioxide can withstand high temperatures, making it reliable for use in applications that involve thermal stress.
- Hardness: SiO₂ provides a protective layer that is scratch-resistant and durable, making it ideal for surface coatings.
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- High Purity: Ensures minimal contamination for reliable thin-film deposition.
- Thermal Stability: Suitable for high-temperature processes.
- Excellent Magnetic Properties: Ideal for magnetics and spintronic applications.
- Optical Performance: High transparency in specific wavelength ranges.
- Custom Configurations: Available in various sizes and purity levels.
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- High Transparency: SnO2 films are highly transparent in the visible light spectrum, making them suitable for optoelectronic applications like transparent conductive films.
- Good Conductivity: Despite its transparency, SnO2 has good electrical conductivity, essential for its role in electrodes and gas sensors.
- Wide Bandgap: SnO2 is a wide-bandgap semiconductor, giving it excellent performance in high-temperature environments and under high-voltage conditions.
- Chemical Stability: Tin oxide is chemically stable, ensuring that films remain durable and resistant to corrosion in various conditions.
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- Semiconductor Properties: SnS₂ has a direct bandgap, making it suitable for absorbing light and generating charge carriers, ideal for photovoltaic and optoelectronic applications.
- High Absorption Coefficient: SnS₂ thin films exhibit high optical absorption, making them effective in solar energy harvesting applications.
- Environmentally Friendly: Tin and sulfur are abundant and non-toxic elements, making SnS₂ a more environmentally benign material compared to some other semiconductor compounds.
- Layered Structure: The layered crystal structure of SnS₂ allows for good ion intercalation in energy storage devices and provides opportunities for 2D material applications.
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- High Purity: ≥ 99.99% purity for optimal thin-film deposition.
- Layered Crystal Structure: Supports efficient film formation and exfoliation.
- Exceptional Thermoelectric Performance: High Seebeck coefficient and low thermal conductivity.
- Broad Application Range: Versatile for electronic, photovoltaic, and thermoelectric uses.
- Customizable Options: Available in various sizes, shapes, and bonding configurations.
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- High Purity: ≥ 99.99% purity ensures consistent and efficient thin-film deposition.
- Layered Structure: Promotes easy exfoliation and high-quality thin-film production.
- Exceptional Optical and Electrical Properties: High carrier mobility and excellent absorption coefficients.
- Thermoelectric Efficiency: Strong performance in thermal-to-electric energy conversion.
- Customizable Options: Tailored sizes and shapes to suit diverse applications.
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- High Purity: Reduces impurities, ensuring superior thin-film quality.
- Stable Composition: Precisely controlled Sn and Te ratio for consistent performance.
- Excellent Film Properties: Produces smooth, high-density, and defect-free films.
- Versatile Deposition: Suitable for PVD and other thin-film coating techniques.
- Customizable Options: Flexible sizes and specifications to fit diverse sputtering systems.
