Showing 133–144 of 251 results

  • MoSi2-Sputtering-Targets-2N5-6N-High-Purity-Molybdenum-Disilicide-Ceramic-Sputtering-Target-High-Pure-99.5-99.9999-Customized-for-Thin-film-Deposition-Tinsan-Materials

    MoSi2 (Molybdenum Disilicide) Sputtering Targets

    • Exceptional Thermal Stability: Operates efficiently in high-temperature environments.
    • High Purity Levels: Ensures superior film quality with minimal defects.
    • Oxidation Resistance: Suitable for protective coatings in harsh conditions.
    • Electrical Conductivity: Ideal for use in electronic and semiconductor applications.
    • Customizable Options: Targets tailored to specific industrial or research needs.
  • MoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsMoTa Alloy Target 99.9%-99.9999% High Purity Molybdenum Tantalum Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    MoTa (Molybdenum Tantalum) Alloy Target

    • High Mechanical Strength: The combination of molybdenum and tantalum results in an alloy with excellent tensile strength, making it ideal for demanding structural applications.
    • Thermal Stability: MoTa alloys maintain their mechanical properties at elevated temperatures, making them suitable for high-temperature applications, such as coatings for turbine components.
    • Oxidation and Corrosion Resistance: The alloy exhibits outstanding resistance to oxidation and corrosion, ensuring long-term performance in harsh environments.
    • Customizable Composition: The molybdenum-to-tantalum ratio can be tailored to optimize the properties of the alloy for specific applications, enhancing strength, thermal stability, or corrosion resistance.
  • MoTe2 Sputtering Target 3N-6N High Purity Molybdenum Ditelluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    MoTe2 (Molybdenum Ditelluride) Sputtering Target

    • Phase Tunability: MoTe₂ can transition between semiconducting and metallic phases, offering versatility in different electronic and optoelectronic applications.
    • High Photoresponse: MoTe₂ thin films are highly responsive to light, especially in the infrared spectrum, making them ideal for photodetectors and imaging devices.
    • 2D Material Properties: As a layered material, MoTe₂ offers exceptional flexibility and mechanical properties, enabling its use in cutting-edge flexible electronics.
    • Thermoelectric Efficiency: MoTe₂ is suitable for thermoelectric applications due to its ability to efficiently convert heat into electricity.
  • MoZrTi Alloy Target 99.95%-99.9999% High Purity Molybdenum Zirconium Titanium Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    MoZrTi (Molybdenum Zirconium Titanium) Alloy Target

    • High Corrosion Resistance: The addition of zirconium and titanium enhances the alloy’s resistance to corrosion, making it suitable for harsh environments, including semiconductor processing and aerospace applications.
    • Thermal Stability: Molybdenum’s high melting point, combined with the stability of zirconium and titanium, allows MoZrTi thin films to maintain performance at elevated temperatures.
    • Electrical Conductivity: MoZrTi alloy thin films provide good electrical conductivity, ideal for applications in electronic devices such as transistors and semiconductors.
    • Mechanical Strength: The alloy offers a combination of strength and toughness, ensuring durability in wear-resistant coatings and industrial components.
    • Oxidation Resistance: MoZrTi thin films resist oxidation, which is critical for maintaining performance over long periods, particularly in high-temperature and oxidative environments.
  • Niobium Sputtering Targets 99.9%-99.9999% High Purity Nb Metal Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan MaterialsNiobium Sputtering Targets 99.9%-99.999% High Purity Nb Metal Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan Materials

    Nb Niobium Sputtering Targets

    • High Purity: Available in purities up to 99.95% to ensure superior film quality.
    • Excellent Durability: Resistant to thermal and mechanical stress during deposition processes.
    • Custom Shapes and Sizes: Adaptable to meet diverse equipment requirements.
    • Consistent Performance: Ensures uniform sputtering rates and film deposition.
    • Corrosion Resistance: Ideal for harsh environmental conditions.
  • Nb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for VacuumPVD Coating - Tinsan MaterialsNb2O5 Sputtering Targets 3N-6N High Purity Niobium Pentoxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Nb2O5 (Niobium Pentoxide) Sputtering Targets

    • High Purity: Ensures minimal contamination for precise thin-film deposition.
    • Excellent Stability: Chemically and thermally stable, suitable for demanding applications.
    • High Refractive Index: Ideal for optical coating applications.
    • Customizable: Available in various sizes, shapes, and configurations.
  • NbC (Niobium Carbide) Sputtering Targets

    • High Hardness: Ensures durability and wear resistance in coatings.
    • Thermal Stability: Withstands high-temperature processes without degradation.
    • Corrosion Resistance: Provides protection in harsh environments.
    • Customizable: Available in various sizes, purities, and configurations to meet specific requirements.
  • NbN Sputtering Targets 3N-5N High Purity Niobium Nitride Sputtering Target High Pure 99.9%-99.999% Customized - Tinsan Materials

    NbN Niobium Nitride Sputtering Targets

    • High Purity: NbN sputtering targets are manufactured with purity levels of up to 99.999%, ensuring excellent film consistency and performance in various deposition applications.
    • Electrical Conductivity: Known for its high electrical conductivity, NbN is used in applications requiring efficient electron flow and low resistance.
    • Thermal Stability: Niobium nitride exhibits excellent thermal stability, maintaining performance even at elevated temperatures, making it suitable for high-temperature applications.
    • Corrosion Resistance: NbN films exhibit outstanding resistance to oxidation and chemical wear, making them ideal for applications in harsh environments.
    • Uniformity in Coating: NbN sputtering targets provide excellent film uniformity and density, ensuring reliable coating processes with minimal defects.
    • Hardness: The resulting NbN films are known for their exceptional hardness, making them suitable for tough, abrasive conditions.
  • NbSe2 (Niobium Diselenide) Sputtering Targets

    • High Purity: ≥99.5% purity to ensure high-quality thin-film deposition.
    • Unique Layered Structure: Facilitates superior electronic and optical properties for advanced applications.
    • Superconducting Properties: Ideal for applications in superconducting electronics and quantum computing research.
    • High Stability: Reliable performance under sputtering conditions with excellent chemical stability.
    • Customizable: Tailored sizes and shapes for different deposition setups.
  • NbSi2 Sputtering Targets 2N5-6N High Purity Niobium Disilicide Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    NbSi2 (Niobium Disilicide) Sputtering Targets

    • High Thermal Stability: Performs reliably in extreme temperatures.
    • Oxidation Resistance: Ideal for protective coatings in harsh environments.
    • Superior Mechanical Strength: Enhances the durability of deposited films.
    • High Purity Standards: Ensures film quality and minimal contamination.
    • Custom Solutions Available: Adaptable to meet specific industrial or research requirements.
  • NbTiO3 Sputtering Target 3N-6N High Purity Niobium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NbTiO3 (Niobium Titanium Oxide) Sputtering Target

    • High Dielectric Constant: NbTiO₃ has a high dielectric constant, making it ideal for capacitors and other electronic components requiring high energy density.
    • Ferroelectric Properties: The ferroelectric nature of NbTiO₃ enables its use in memory devices and sensors that need stable, reliable performance under varying conditions.
    • Optical Transparency: NbTiO₃ thin films provide excellent optical transparency, ensuring their application in optoelectronic devices and displays.
    • Chemical and Thermal Stability: NbTiO₃ films are highly stable in both chemical and thermal environments, ensuring long-lasting performance in demanding applications.
  • Tinsan Materials Neodymium Sputtering Target 99.9%-99.999% High Purity Nd Metal Sputtering Targets 3N-5N CustomizedTinsan Materials Neodymium Sputtering Target 99.9%-99.999% High Purity Nd Metal Sputtering Targets 3N-5N Customized

    Nd Neodymium Sputtering Target

    • Purity: High purity (99.9% or higher) is critical to ensure the quality and performance of the deposited film.
    • Shape and Size: These targets are available in different shapes, such as discs, plates, and cylinders, with customizable dimensions to fit specific sputtering systems.
    • Density and Grain Size: Neodymium targets are manufactured with high density and controlled grain size to improve sputtering efficiency and consistency.
    • Magnetic Properties: Neodymium is ferromagnetic, making it ideal for applications requiring magnetic properties.