Showing 109–120 of 255 results

  • Li3PO4 Sputtering Targets 3N-6N High Purity Lithium Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Li3PO4 (Lithium Phosphate) Sputtering Targets

    • High Purity: Guarantees low contamination for critical applications.
    • Chemical Stability: Resistant to degradation, ensuring durable coatings.
    • Superior Ionic Conductivity: Optimal for battery and energy storage films.
    • Consistent Deposition: Ensures uniform and reliable thin-film performance.
    • Customizable Dimensions: Adaptable to different sputtering systems and requirements.
  • Li4Ti5O12 Sputtering Target 3N-6N High Purity Lithium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLi4Ti5O12 Sputtering Target 3N-6N High Purity Lithium Titanium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Li4Ti5O12 (Lithium Titanium Oxide) Sputtering Target

    $1.00$424.00
    • High Stability: Li₄Ti₅O₁₂ has excellent chemical and structural stability, making it an ideal material for long-lasting energy storage devices.
    • Low Volume Expansion: This material shows minimal expansion and contraction during charge/discharge cycles, improving battery longevity.
    • Thermal Safety: Li₄Ti₅O₁₂ has a high thermal stability, reducing the risk of overheating in energy storage devices.
    • Fast Charging Capability: The material is recognized for its fast charge/discharge properties, making it suitable for high-performance batteries.
    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • LiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiCoO2 Sputtering Target 3N-6N High Purity Lithium Cobalt Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiCoO2 (Lithium Cobalt Oxide) Sputtering Target

    • High Energy Density: LiCoO₂ has a high theoretical energy density, making it an ideal material for battery cathodes, especially in high-performance applications like electric vehicles and portable electronics.
    • Stable Structure: The layered crystal structure of LiCoO₂ contributes to its stable electrochemical performance, which is crucial for the long-term operation of lithium-ion batteries.
    • Excellent Cycling Performance: LiCoO₂ can undergo many charge and discharge cycles without significant degradation, ensuring reliable performance in rechargeable battery systems.
    • Thin Film Deposition: LiCoO₂ sputtering targets allow for the precise deposition of thin films in applications requiring uniform coatings, such as in thin-film batteries and microelectronics.
  • LiF Sputtering Target 3N-6N High Purity Lithium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiF (Lithium Fluoride) Sputtering Target

    • High Optical Transparency: LiF has high optical transparency in the UV, visible, and infrared regions, making it an excellent material for optical coatings and components.
    • Wide Bandgap: LiF has a wide bandgap (~13.6 eV), which makes it an excellent insulating material in electronic and optoelectronic applications.
    • Low Absorption: LiF thin films exhibit low absorption across a broad spectral range, making them ideal for applications where minimal light loss is required.
    • Chemical Stability: LiF is chemically stable and resistant to moisture, which contributes to its durability in harsh environments and long-lasting performance in thin-film coatings.
    • Insulating Properties: LiF has excellent insulating properties, which are beneficial for electronic and optoelectronic devices where electrical isolation is needed.
  • LiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiFePO4 Sputtering Targets 3N-6N High Purity Lithium Iron Phosphate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    LiFePO4 (Lithium Iron Phosphate) Sputtering Targets

    • High Purity: Ensures minimal impurities, delivering superior film quality.
    • Thermal Stability: Provides consistent performance under varying conditions.
    • Safety Profile: Stable chemistry reduces risks of thermal runaway.
    • Customizable Dimensions: Tailored to fit a range of sputtering systems.
    • Reliable Deposition: Delivers uniform and high-quality thin films.
  • LiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsLiNbO3 Sputtering Target 3N-6N High Purity Lithium Niobate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    LiNbO3 (Lithium Niobate) Sputtering Target

    $1.00$595.00
    • High Electro-optic Coefficient: LiNbO₃ has a high electro-optic coefficient, enabling efficient modulation of light in waveguides, modulators, and telecommunications devices.
    • Excellent Piezoelectric Properties: LiNbO₃’s strong piezoelectric response makes it ideal for use in SAW devices, sensors, and actuators, providing high sensitivity and control.
    • Nonlinear Optical Capabilities: LiNbO₃ is widely used for frequency conversion and other nonlinear optical applications due to its strong nonlinear optical response.
    • Ferroelectric Behavior: LiNbO₃’s ferroelectric properties are valuable in memory devices and data storage, enabling the development of non-volatile memory technologies.
    • Stable and Durable Thin Films: LiNbO₃ thin films exhibit high thermal and chemical stability, making them suitable for use in demanding environments and high-performance applications.
    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • LiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan MaterialsLiTaO3 Sputtering Targets 3N-6N High Purity Lithium Tantalate Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin-film Deposition - Tinsan Materials

    LiTaO3 (Lithium Tantalate) Sputtering Targets

    • High Purity: Ensures minimal impurities for superior thin-film quality.
    • Exceptional Piezoelectric Properties: Ideal for high-performance acoustic and vibrational devices.
    • Stable Electro-Optic Behavior: Suitable for high-precision optical applications.
    • Customizable Specifications: Tailored to meet unique system requirements.
    • Durable and Reliable: Manufactured for consistent sputtering performance.
  • LiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsLiV3O8 Sputtering Targets 3N-6N High Purity Lithium Vanadium Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    LiV3O8 (Lithium Vanadium Oxide) Sputtering Targets

    • High Purity: Ensures consistent and reliable thin-film deposition.
    • Superior Electrochemical Performance: Supports high energy density and stability.
    • Customizable Options: Available in various sizes, shapes, and purity levels.
    • Durable and Stable: Delivers reliable performance in demanding environments.
    • Scalability: Suitable for both research-scale and industrial-scale applications.
  • Magnesium Fluoride (MgF₂) Sputtering Target 99.99% - Tinsan MaterialsMagnesium Fluoride (MgF₂) Sputtering Target 99.99% Purity - Tinsan Materials

    Magnesium Fluoride (MgF₂) Sputtering Target, 99.99%

    • Anti-Reflective Coatings: MgF₂ is widely used as a low-refractive-index material in anti-reflective coating systems designed to reduce reflection and improve optical transmission.
    • UV Optical Coatings: Its broad transmission range makes magnesium fluoride particularly useful for ultraviolet optical components and coating systems.
    • Laser Optics: MgF₂ thin films can be incorporated into optical coating stacks for laser windows, lenses, mirrors, and related optical components.
    • Optical Filters: Magnesium fluoride can serve as a low-index layer in multilayer interference filters and other wavelength-selective optical coatings.
    • Precision Optical Components: MgF₂ coatings are used on lenses, windows, prisms, and other precision optical components where controlled reflection and transmission are required.
    • Research & Thin-Film Development: High-purity MgF₂ sputtering targets are also used by universities, laboratories, and R&D facilities for the development of fluoride thin films and advanced optical structures.
  • High Purity Manganese Selenide (MnSe) Sputtering Target 99.9% Purity Ø50.8mm

    Manganese Selenide (MnSe) Sputtering Target | Mn:Se = 1:1 at% | 99.9% Purity | Ø50.8mm

    $895.00
    • High purity: 99.9% (3N) for consistent film composition
    • Precise alloy ratio (1:1 at%) for uniform deposition
    • Indium bonding + copper backing plate for efficient heat transfer
    • Compatible with magnetron sputtering systems
    • Supports stable deposition rates & low impurity levels
    • Customizable sizes, thicknesses, and atomic ratios available
    Select optionsLoading Done This product has multiple variants. The options may be chosen on the product page
  • Mg3Bi2 Sputtering Target 3N-6N High Purity Magnesium Bismuth Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Mg3Bi2 (Magnesium Bismuth) Sputtering Target

    • High Thermoelectric Efficiency: Magnesium Bismuth is recognized for its high Seebeck coefficient and low thermal conductivity, making it an efficient material for thermoelectric applications.
    • Low-Temperature Thermoelectrics: Mg3Bi2 is particularly effective at lower temperatures, which makes it suitable for a wide range of thermoelectric devices that operate in ambient conditions.
    • Customizable Film Properties: The thin films produced using Mg3Bi2 targets can be tailored in terms of thickness and crystallinity, allowing for optimization in various applications.
    • Chemical Stability: Magnesium Bismuth films exhibit good stability, ensuring reliable performance over time in demanding environments.
  • MgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan MaterialsMgF2 Sputtering Target 3N-6N High Purity Magnesium Fluoride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Vacuum PVD Coating - Tinsan Materials

    MgF2 (Magnesium Fluoride) Sputtering Target

    • Broad Transparency Range: MgF₂ has excellent transmission across UV, visible, and IR spectra, making it an ideal material for high-performance optical coatings.
    • Low Refractive Index: The low refractive index of MgF₂ helps reduce light reflection, enabling its use in anti-reflective coatings for various optical applications.
    • High Hardness and Durability: Magnesium Fluoride films are known for their hardness and resistance to scratching, making them suitable for protective coatings in high-durability environments.
    • Chemical and Environmental Stability: MgF₂ coatings are chemically inert and stable under extreme temperature conditions, enhancing their use in both optical and electronic applications.