Showing 73–84 of 251 results

  • FeCoTa Alloy Target 99.95%-99.9999% High Purity Ferrum Cobalt Tantalum Alloy Sputtering Targets 3N5-6N Customized - Tinsan Materials

    FeCoTa (Iron Cobalt Tantalum) Alloy Target

    • High Magnetic Saturation: The FeCoTa alloy offers excellent magnetic properties, including high magnetic saturation and low coercivity, making it ideal for use in data storage devices and other applications requiring strong and stable magnetic fields.
    • Thermal Stability: The addition of tantalum enhances the alloy’s thermal stability, allowing FeCoTa thin films to perform reliably in high-temperature environments, such as aerospace and power electronics.
    • Wear Resistance: Tantalum in the alloy also contributes to increased wear resistance, ensuring that the thin films maintain their integrity under mechanical stress and prolonging their lifespan.
    • Corrosion Resistance: The alloy exhibits good resistance to corrosion, making it suitable for applications in harsh or outdoor environments.
    • Customizable Composition: The ratio of Fe, Co, and Ta can be adjusted to optimize magnetic and physical properties for specific applications.
  • FeCr Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeCr Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Chromium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeCr (Iron Chromium) Alloy Target

    • Corrosion Resistance: The high chromium content in FeCr alloys provides excellent resistance to corrosion, making the alloy ideal for environments exposed to moisture, chemicals, or harsh conditions.
    • Magnetic Properties: FeCr alloys offer stable magnetic properties, making them suitable for use in various magnetic storage and electronic devices.
    • High-Temperature Stability: FeCr thin films maintain their mechanical strength and performance even at elevated temperatures, making them useful for applications in energy, aerospace, and other industries requiring heat-resistant coatings.
    • Wear Resistance: The wear resistance of FeCr thin films ensures long-lasting durability for coated components, reducing wear and tear in mechanical systems and industrial tools.
    • Customizable Composition: The ratio of iron to chromium can be adjusted to optimize the properties such as corrosion resistance, magnetic performance, or wear resistance, based on the application’s specific requirements.
  • FeGa Sputtering Targets 99.9%-99.9999% High Purity Ferrum Iron Gallium Alloy Sputtering Target 3N-6N Customized for Thin Film Deposition - Tinsan Materials

    FeGa (Iron-Gallium) Sputtering Targets

    • High Magnetostriction: FeGa alloys exhibit superior magnetostrictive properties, providing enhanced performance in functional films.
    • Customizable Compositions: Available in various iron-gallium ratios to meet specific application requirements.
    • High Purity: Ensures consistent and reliable thin-film deposition with minimal contamination.
    • Excellent Magnetic Properties: Combines strength and magnetic responsiveness for advanced thin-film applications.
    • Durable and Stable: Provides robust and long-lasting performance in challenging environments.
  • FeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeHf Alloy Target 99.9%-99.9999% High Purity Ferrum Iron Hafnium Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeHf (Iron Hafnium) Alloy Target

    • Magnetic Stability: FeHf alloys offer stable magnetic properties that make them suitable for use in a variety of magnetic devices, especially in high-temperature or harsh environments.
    • Oxidation Resistance: The addition of hafnium significantly improves the alloy’s resistance to oxidation, making FeHf thin films suitable for applications exposed to elevated temperatures and oxidative conditions.
    • High Strength: FeHf alloy thin films provide excellent mechanical strength, ensuring long-term durability and reliability in high-stress environments.
    • Thermal Stability: FeHf alloys maintain their structural integrity and performance even at high temperatures, making them ideal for applications in electronics, aerospace, and industrial settings.
    • Corrosion Resistance: The alloy’s resistance to corrosion allows it to perform well in harsh environments, protecting components from degradation due to moisture, chemicals, and other corrosive elements.
  • FeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsFeMn Alloy Target 99.9%-99.9999% High Purity Ferrum Manganese Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    FeMn (Iron Manganese) Alloy Target

    • Magnetic Properties: FeMn alloys exhibit useful magnetic properties, including antiferromagnetism, which makes them suitable for use in a variety of magnetic devices, sensors, and memory technologies.
    • Corrosion Resistance: The alloy provides excellent resistance to corrosion, making it ideal for use in environments exposed to moisture, chemicals, and other corrosive agents.
    • Wear Resistance: FeMn alloy thin films enhance the wear resistance of components, making them more durable under mechanical stress and wear, especially in industrial and mechanical applications.
    • Customizable Composition: The ratio of iron to manganese can be adjusted to tailor the magnetic, mechanical, and corrosion-resistant properties of the thin films for specific applications.
    • High Strength: FeMn thin films exhibit high mechanical strength, making them ideal for applications where both durability and protection are required, especially in harsh environments.
  • FTO Sputtering Targets 3N-6N High Purity Fluorine-doped Tin Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    FTO (Fluorine-doped Tin Oxide) Sputtering Targets

    • High Transparency: Excellent light transmission in the visible spectrum.
    • Superior Conductivity: Low sheet resistance for high-performance electrical applications.
    • Thermal Stability: Performs reliably under high temperatures.
    • Chemical Resistance: Highly resistant to environmental and chemical degradation.
    • Customizable Options: Adaptable to diverse deposition system requirements.
  • GaN Sputtering Target 4N-5N High Purity Gallium Nitride Ceramic Sputtering Targets High Pure 99.99%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    GaN (Gallium Nitride) Sputtering Targets

    • Chemical Formula: GaN
    • Molecular Weight: 83.73 g/mol
    • Density: 6.15 g/cm³
    • Bandgap: ~3.4 eV
    • Melting Point: ~2500°C (decomposes)
    • Purity Levels: 99.99% (4N), 99.999% (5N)
    • Electrical Conductivity: High electron mobility and breakdown voltage
    • Thermal Conductivity: Excellent heat dissipation for high-power applications
  • GaS Sputtering Target 3N-6N High Purity Gallium Sulfide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GaS (Gallium Sulfide) Sputtering Target

    • Wide Bandgap: GaS possesses a wide bandgap of about 2.5 eV, making it suitable for UV and visible light applications.
    • High Purity: GaS targets are available in high-purity forms to ensure the quality and performance of the deposited films.
    • Layered Structure: The layered nature of GaS allows for easy mechanical exfoliation, enabling the production of high-quality monolayers and thin films.
    • Thermal Stability: GaS exhibits good thermal stability, maintaining its properties during high-temperature processing.
    • Good Electrical Conductivity: GaS is a good electrical conductor, making it valuable in electronic applications.
  • Tinsan Materials Gadolinium Sputtering Target 99.9%-99.9999% High Purity Gd Metal Sputtering Targets 3N-6N CustomizedTinsan Materials Gadolinium Sputtering Target 99.9%-99.9999% High Purity Gd Metal Sputtering Targets 3N-6N Customized

    Gd Gadolinium Sputtering Target

    • Purity: Typically available at 99.9% or higher purity to ensure optimal film quality and performance.
    • Customizable Size and Shape: Gadolinium sputtering targets are available in various forms, such as discs, plates, or cylinders, tailored to specific deposition systems.
    • Magnetic Properties: Gadolinium’s strong magnetic characteristics are highly desirable in magnetic thin films.
    • Oxidation Resistance: Gadolinium can be coated or alloyed to prevent oxidation during sputtering.
  • Gd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsGd2O3 Sputtering Target 3N-6N High Purity Gadolinium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Gd2O3 (Gadolinium Oxide) Sputtering Target

    • High Purity: Available in high-purity levels to ensure the quality of thin films for sensitive electronic and optical applications.
    • Magnetic Properties: Gd₂O₃ exhibits strong magnetic behavior, making it suitable for applications in magnetic storage and spintronic devices.
    • High-k Dielectric: Its high dielectric constant makes Gd₂O₃ ideal for use in semiconductor devices as a gate dielectric material.
    • Thermal Stability: Gd₂O₃ is thermally stable, maintaining its structural integrity and properties during high-temperature processes.
  • GeS Sputtering Targets 3N-6N High Purity Germanium Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GeS (Germanium Sulfide) Sputtering Targets

    • Semiconducting properties: GeS is a semiconductor with excellent electrical conductivity, ideal for use in electronic and optoelectronic applications.
    • Optical performance: The material exhibits specific optical properties that make it suitable for optoelectronic and sensor devices.
    • High purity: GeS sputtering targets are available in high purity for optimal thin film quality.
    • Customizable: Can be tailored for various applications, with flexibility in composition, size, and target specifications.
  • GeSbTe Sputtering Targets 4N-7N High Purity Germanium Antimony Telluride Ceramic Sputtering Target High Pure 99.99%-99.99999% Customized - Tinsan Materials

    GeSbTe (Germanium Antimony Telluride) Sputtering Targets

    • Phase-change properties: GeSbTe materials can change from an amorphous to a crystalline state, making them suitable for high-speed data storage.
    • High thermal stability: Provides reliable performance under a wide range of temperatures.
    • Good electrical and optical properties: Offers optimal conductivity and transparency needed for memory and optical devices.
    • Customization: Available in various compositions and dimensions, meeting specific application requirements.