Showing 13–24 of 35 results

  • NiCrSi Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Silicon Alloy Sputtering Targets 3N-6N Customized - Tinsan MaterialsNiCrSi Alloy Target 99.9%-99.9999% High Purity Nickel Chromium Silicon Alloy Sputtering Targets 3N-6N Customized - Tinsan Materials

    NiCrSi (Nickel Chromium Silicon) Alloy Target

    • High Electrical Resistivity: The NiCrSi alloy has a stable electrical resistivity, making it ideal for thin-film resistor applications and other electronics requiring consistent electrical performance.
    • Corrosion and Oxidation Resistance: The combination of nickel and chromium provides excellent resistance to corrosion and oxidation, even at elevated temperatures.
    • Thermal Stability: The NiCrSi alloy retains its mechanical and electrical properties at high temperatures, ensuring reliable performance in thermal management systems and high-temperature applications.
    • Customizable Composition: The nickel, chromium, and silicon content can be adjusted to fine-tune the properties of the alloy for specific applications, including optimizing resistivity or corrosion resistance.
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  • NiSi2 Pellets Evaporation Material 3N-6N High Purity Nickel Disilicide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    NiSi2 (Nickel Disilicide) Pellets Granules Evaporation Materials

    • Low Resistivity: NiSi₂ has excellent electrical conductivity, making it ideal for forming low-resistance contacts in silicon-based devices.
    • Thermal Stability: NiSi₂ films maintain their performance at high temperatures, which is critical for high-temperature semiconductor processing.
    • Good Adhesion: Thin films of NiSi₂ adhere well to silicon and other substrates, ensuring durability in semiconductor devices.
    • High Purity: The high purity (typically ≥ 99.9%) of the material ensures that the deposited films have superior performance in sensitive electronic applications.
    • Excellent Silicon Compatibility: NiSi₂ integrates well with silicon, which is crucial for creating stable, conductive contacts in silicon devices.
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  • Quartz (SiO2) Single CrystalQuartz (SiO2) Single Crystals

    Quartz (SiO2) Single Crystal

    High-Purity Single Crystal Quartz for Optical, Piezoelectric, Electronic and Research Applications

    High-quality Quartz (SiO₂) single crystals offering excellent piezoelectric properties, optical transparency, low dielectric loss, and long-term stability. Available in natural or synthetic grades, with X, Y, Z, AT, BT, SC, ST, and custom cuts. Custom sizes, shapes, and surface finishes are available for optical, acoustic, sensor, frequency-control, and research applications.

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  • Silicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customized - Tinsan MaterialsSilicon Pellets Evaporation Material 3N-7N High Purity Si Granules Particles for Coating High Pure 99.9%-99.99999% Customize - Tinsan Materials

    Si Silicon Granules 3N – 7N (99.9% – 99.99999%) Pellets (Intrinsic/N-Type/P-Type)

    $10.00 – $335.00
    • High Purity: Silicon pellets typically have a purity of ≥ 99.9%, ensuring high-quality thin-film deposition with minimal contamination.
    • Semiconductor Properties: Silicon’s intrinsic semiconducting properties make it crucial for electronic and optoelectronic applications.
    • Thermal Stability: Silicon can withstand high temperatures during deposition, providing stable and uniform films.
    • Infrared Transparency: Silicon exhibits excellent transparency in the infrared (IR) range, making it suitable for IR optics and coatings.
    • Easy Evaporation: Silicon pellets are easily evaporated using thermal or electron-beam evaporation techniques, allowing for precise control in thin-film deposition.
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  • Silicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan MaterialsSilicon Sputtering Target 99.9%-99.99999% High Purity Si Sputtering Targets 3N-7N Customized - Tinsan Materials

    Si Silicon Sputtering Targets (Intrinsic/N-Type/P-Type)

    • Purity: Silicon sputtering targets are typically available in high purity (99.999% or higher) to ensure high-performance film deposition, particularly in sensitive semiconductor applications.
    • Electrical Properties: Silicon is an intrinsic semiconductor, and thin films made from silicon offer excellent electrical characteristics for electronic and optoelectronic devices.
    • Thermal Conductivity: Silicon’s thermal properties make it ideal for applications where heat dissipation is important, such as in power electronics and solar cells.
    • Customizable Size and Shape: Silicon sputtering targets come in various forms, including discs, plates, and custom shapes to fit different deposition systems.
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  • Si2Te3 Sputtering Targets 2N5-6N High Purity Silicon Telluride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan Materials

    Si2Te3 (Silicon Telluride) Sputtering Targets

    • High Purity: Ensures minimal contamination and consistent deposition performance.
    • Optimal Stoichiometry: Precisely controlled Si and Te ratio for superior material properties.
    • Wide Compatibility: Suitable for various deposition techniques, including PVD and sputtering.
    • Excellent Film Properties: Supports the production of uniform, high-quality thin films.
    • Customizable Options: Flexible sizes and shapes to fit diverse sputtering systems.
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  • Si3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Pellets Evaporation Materials 3N-6N High Purity Silicon Nitride Granules Particles for Thin Film Deposition High Pure 99.9%-99.9999% Customize - Tinsan Materials

    Si3N4 (Silicon Nitride) Pellets Granules Evaporation Materials

    • High purity (≥99.9%).
    • Outstanding thermal and mechanical stability.
    • Uniform pellet size for precise deposition.
    • Customizable sizes and specifications.
    • Superior resistance to oxidation, corrosion, and wear.
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  • Si3N4 Powder 2N-5N High Purity Silicon Nitride Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Powder

    • High Purity: Purity levels up to 99.999% for critical applications.
    • Superior Mechanical Strength: Exceptional hardness and fracture toughness.
    • Thermal Stability: Outstanding resistance to thermal shock and high-temperature environments.
    • Chemical Resistance: Resistant to oxidation, corrosion, and chemical reactions.
    • Low Thermal Expansion: Ideal for applications requiring dimensional stability.
    • Customizable Particle Sizes: Nano and micron sizes to fit diverse applications.
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  • Si3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSi3N4 Sputtering Target 3N-6N High Purity Silicon Nitride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    Si3N4 (Silicon Nitride) Sputtering Target

    • High Hardness: Si₃N₄ thin films are extremely hard and wear-resistant, making them ideal for applications in harsh mechanical environments.
    • Excellent Thermal Stability: Si₃N₄ offers high thermal stability, ensuring reliability and performance in high-temperature applications, such as semiconductors and aerospace components.
    • Low Thermal Expansion: Silicon Nitride exhibits low thermal expansion, contributing to its stability and performance under thermal stress.
    • Chemical Resistance: Si₃N₄ is chemically inert and resists corrosion from most acids, bases, and chemical agents, which makes it suitable for protective coatings in chemically aggressive environments.
    • Insulating Properties: Si₃N₄ films are used as dielectric materials due to their excellent electrical insulating properties, ensuring their use in semiconductor and electronic applications.
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  • SiC Pellets Evaporation Material 3N-6N High Purity Silicon Carbide Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Pellets Granules Evaporation Materials

    • High Hardness: SiC is one of the hardest materials available, making it ideal for protective coatings and abrasive applications.
    • High Thermal Conductivity: SiC efficiently dissipates heat, making it suitable for high-temperature coatings in optical and electronic devices.
    • Chemical Stability: SiC is highly resistant to corrosion and oxidation, which is beneficial for coatings in harsh environments.
    • Wide Bandgap: In electronics, SiC thin films enable higher efficiency in power management and thermal resistance.
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  • SiC Powder 2N-5N High Purity Silicon Carbide Nanopowder Nano Powder Nanoparticles High Pure 99%-99.999% Customized - Tinsan Materials

    SiC (Silicon Carbide) Powder

    • Exceptional Hardness: Mohs hardness of 9.2, ideal for abrasives and wear-resistant applications.
    • Thermal Resistance: Stable in high-temperature environments up to 2,700°C.
    • High Thermal Conductivity: Efficient heat transfer for thermal management.
    • Chemical Inertness: Resistant to corrosion and oxidation in harsh conditions.
    • Customizable Particle Sizes: Nano and micron sizes for specialized applications.
    • Eco-friendly: Minimal environmental impact during use.
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  • SiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan MaterialsSiC Sputtering Targets 3N-6N High Purity Silicon Carbide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize - Tinsan Materials

    SiC (Silicon Carbide) Sputtering Targets

    • Exceptional Hardness: Ideal for durable, wear-resistant coatings.
    • High Thermal Stability: Performs well under extreme temperatures.
    • Wide Bandgap Properties: Suitable for high-power and high-frequency applications.
    • Chemical Resistance: Resilient to corrosive environments.
    • Customizable Configurations: Available in various sizes, purities, and bonding options.
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