Showing 85–96 of 251 results

  • GeSe2 Sputtering Target 99.9%-99.9999% High Purity Germanium Selenium Ceramic Sputtering Targets High Pure 3N-6N Customized - Tinsan Materials

    GeSe2 (Germanium Selenide) Sputtering Targets

    • Infrared Transparency: GeSe₂ offers excellent transmission in the infrared spectrum, making it suitable for IR optics and photonic applications.
    • Phase-Change Properties: GeSe₂ is a key material in phase-change memory technology, providing the ability to switch between different states under thermal or electrical stimuli.
    • Chemical and Thermal Stability: GeSe₂ thin films exhibit strong chemical resistance and can withstand high temperatures, ensuring longevity and performance in harsh conditions.
    • High Refractive Index: GeSe₂ has a high refractive index, making it suitable for optical applications requiring materials with specific light-bending capabilities.
  • GZO Sputtering Targets 3N-6N High Purity Gallium-doped Zinc Oxide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    GZO (Gallium-doped Zinc Oxide) Sputtering Targets

    • Transparent Conductivity: GZO has a high optical transparency in the visible range while maintaining excellent electrical conductivity.
    • High Carrier Mobility: Gallium doping improves the carrier mobility in the Zinc Oxide structure, leading to enhanced performance in electrical applications.
    • Low Resistivity: The addition of Gallium significantly reduces the resistivity of the material, making it suitable for transparent electrodes.
    • Durability: GZO sputtering targets provide long-lasting performance in deposition processes, ensuring high-quality thin films with uniform characteristics.
    • Versatility: Suitable for both DC and RF sputtering techniques, making them versatile for different deposition equipment.
  • HfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customized - Tinsan MaterialsHfB2 Sputtering Targets 2N5-6N High Purity Hafnium Diboride Ceramic Sputtering Target High Pure 99.5%-99.9999% Customize - Tinsan Materials

    HfB2 (Hafnium Diboride) Sputtering Targets

    • High Purity: Ensures reliable deposition results with minimal impurities.
    • Thermal Resistance: Outstanding stability under extreme temperatures.
    • High Hardness: Provides superior durability for wear-resistant coatings.
    • Electrical Conductivity: Suitable for conductive thin-film applications.
    • Custom Configurations: Flexible options to meet specific deposition requirements.
  • HfC Sputtering Targets 2N5-5N High Purity Hafnium Carbide Ceramic Sputtering Target High Pure 99.5%-99.999% Customized for Thin Film Deposition - Tinsan Materials

    HfC (Hafnium Carbide) Sputtering Targets

    • High Purity: Available in purities of 99.5% or higher to ensure optimal film quality.
    • Thermal Stability: Exceptional resistance to high temperatures and thermal stress.
    • Mechanical Strength: High hardness and excellent wear resistance.
    • Oxidation Resistance: Stable in extreme environments.
  • HfN Sputtering Targets 2N5-5N High Purity Hafnium Nitride Ceramic Sputtering Target High Pure 99.5%-99.999% Customized - Tinsan Materials

    HfN (Hafnium Nitride) Sputtering Targets

    • High Hardness: Produces durable and wear-resistant films.
    • Thermal Stability: Withstands high temperatures in extreme environments.
    • Corrosion Resistance: Ideal for chemically aggressive applications.
    • Electrical Conductivity: Offers low resistivity for electronic applications.
    • Customizable Properties: Tailored compositions and sizes to meet specific needs.
  • HfO2 Sputtering Target 3N-6N High Purity Hafnium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsHfO2 Sputtering Target 3N-6N High Purity Hafnium Dioxide Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    HfO2 (Hafnium Dioxide) Sputtering Target

    • High Dielectric Constant: HfO₂ offers a high k-value, making it suitable for advanced gate dielectrics in semiconductor applications, allowing better transistor scaling.
    • Optical Transparency: HfO₂ films are transparent over a wide range of wavelengths, from UV to IR, making them ideal for optical coatings in lenses and mirrors.
    • Thermal and Chemical Stability: HfO₂ sputtering targets produce thin films with excellent resistance to high temperatures and harsh environments, ensuring durability in industrial and research applications.
    • Ferroelectric Properties: HfO₂ can exhibit ferroelectric behavior, making it crucial for non-volatile memory devices such as FeRAM.
  • Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) Sputtering Targets 3N High Purity HAP Ceramic Sputtering Target High Pure 99.9% Customized for Thin Film Deposition - Tinsan Materials

    Hydroxyapatite (Ca₁₀(PO₄)₆(OH)₂) HAP Sputtering Targets

    $1.00$296.00
    • Biocompatibility: Safe for use in medical applications.
    • Bioactivity: Promotes cell growth and bone regeneration.
    • High Purity: Ensures consistent performance in sensitive applications.
    • Customizable Options: Available in various sizes and compositions to meet specific project needs.
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  • IGZO Ceramic Target 99.9%-99.9999% High Purity Indium Gallium Zinc Oxide Ceramic Sputtering Targets High Pure 3N-6N Customized for VacuumPVD Coating - Tinsan MaterialsIGZO Ceramic Target 99.9%-99.9999% High Purity Indium Gallium Zinc Oxide Ceramic Sputtering Targets High Pure 3N-6N Customized for VacuumPVD Coating - Tinsan Materials

    IGZO (Indium Gallium Zinc Oxide) Ceramic Targets

    • High Electron Mobility: IGZO offers much higher electron mobility than amorphous silicon, leading to faster switching speeds and improved performance in TFT-based devices.
    • Low Power Consumption: IGZO thin films help reduce power usage in displays and electronics, making them ideal for energy-efficient applications.
    • Transparency: IGZO is a transparent conductive oxide, which is essential for applications in display and touch panel technologies.
    • Thermal Stability: IGZO provides excellent thermal stability, ensuring reliable performance even under high temperatures during processing.
    • Scalability for High-Resolution Displays: Due to its high electron mobility, IGZO is well-suited for producing ultra-high-resolution displays (such as 4K and 8K) with faster refresh rates and greater detail.
  • Indium Sputtering Targets 99.9%-99.99999% High Purity In Metal Sputtering Target 3N-7N Customized for Thin Film Deposition - Tinsan MaterialsIndium Sputtering Targets 99.9%-99.99999% High Purity In Metal Sputtering Target 3N-7N Customized - Tinsan Materials

    In Indium Sputtering Targets

    • High Purity: Available in high-purity grades to ensure excellent film quality and performance.
    • Thermal and Electrical Conductivity: Indium offers great conductivity, making it ideal for electronic and optical applications.
    • Malleability: The material can be easily shaped and deposited to meet specific needs.
    • Uniform Deposition: Ensures high-quality and uniform films, critical for advanced technologies.
    • Corrosion Resistance: Resistant to corrosion, enhancing the durability and longevity of the coatings.
  • In2O3 Sputtering Target 3N-7N High Purity Indium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan MaterialsIn2O3 Sputtering Target 3N-7N High Purity Indium Oxide Ceramic Sputtering Targets High Pure 99.9%-99.99999% Customized - Tinsan Materials

    In2O3 (Indium Oxide) Sputtering Target

    • High Transparency: In2O3 is optically transparent in the visible range, making it ideal for transparent electrode applications.
    • Good Conductivity: Indium oxide offers good electrical conductivity, which can be optimized for use in optoelectronic devices and transparent electrodes.
    • Chemical Stability: In2O3 is chemically stable, ensuring long-term durability of thin films in harsh environments.
    • Wide Bandgap: The wide bandgap of indium oxide allows it to function effectively in optoelectronic and sensor applications, especially in high-temperature conditions.
    • Custom Purity Levels: In2O3 sputtering targets are available in high purities (up to 99.999%) to ensure the deposition of high-quality, defect-free films.
  • In2S3 Sputtering Targets 3N-6N High Purity Indium Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin-Film Deposition - Tinsan MaterialsIn2S3 Sputtering Targets 3N-6N High Purity Indium Sulfide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin-Film Deposition - Tinsan Materials

    In2S3 (Indium Sulfide) Sputtering Targets

    • High Optical Transparency: Suitable for applications requiring minimal light absorption.
    • Wide Bandgap: Excellent for photovoltaic and semiconductor applications.
    • Low Toxicity: Eco-friendly alternative to cadmium-based materials.
    • Customizable Specifications: Tailored for specific deposition processes and applications.
    • High Purity: Ensures consistent film quality and enhanced device performance.
  • In2Se3 Sputtering Targets 3N-6N High Purity Indium Selenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsIn2Se3 Sputtering Targets 3N-6N High Purity Indium Selenide Ceramic Sputtering Target High Pure 99.9%-99.9999% Customize for Thin Film Deposition - Tinsan Materials

    Indium Selenide (In2Se3) Sputtering Targets

    • High Optical Absorption: Ideal for solar energy harvesting applications.
    • Semiconductor Versatility: Tunable electronic properties for various device designs.
    • Eco-Friendly Composition: Cadmium-free material for safer and sustainable usage.
    • Customizable Solutions: Specifications tailored to meet specific deposition requirements.
    • High Purity: Ensures consistent and high-quality thin films.